Patent
Deep ultraviolet light source, mask inspection device using same, and exposure device
Kiwamu Takehisa,究 武久 +1 more
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TLDR
In this article, the authors proposed to provide a mask inspection device and an exposure device which have a high defect detection sensitivity due to this deep ultraviolet laser light source and are small-sized and stable.Abstract:
PROBLEM TO BE SOLVED: To provide a laser light source which can be operated at room temperature and is capable of efficiently generate deep ultraviolet rays and to provide a mask inspection device and an exposure device which have a high defect detection sensitivity due to this deep ultraviolet laser light source and are small-sized and stable SOLUTION: The deep ultraviolet light source includes; a solid laser which emits laser light having a wavelength of 090 to 092μm; a fourth higher harmonic generation part which generates the fourth higher harmonic of the laser light having the wavelength of 090 to 092μm, which is taken out from the solid laser; and a sum frequency generation part which generates light having a sum frequency of the fourth higher harmonic generated by the fourth higher harmonic generation part and laser light having a wavelength of 13μm COPYRIGHT: (C)2007,JPO&INPITread more
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