L
Lee Chen
Researcher at IBM
Publications - 2
Citations - 73
Lee Chen is an academic researcher from IBM. The author has contributed to research in topics: Etching (microfabrication) & Plasma etching. The author has an hindex of 2, co-authored 2 publications receiving 73 citations.
Papers
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Patent
Optical emission spectroscopy end point detection in plasma etching
TL;DR: In this article, a method for etching a batch of semiconductor wafers to end point using optical emission spectroscopy is described, which is applicable to any form of dry plasma etching which produces an emission species capable of being monitored.
Patent
Method of plasma etching
TL;DR: In this article, a method of plasma etching a batch of semiconductor wafers to end point using optical emission spectroscopy is described, and the simulation produces a time period for continuing the etching process past detected time while monitoring the intensity of emission of the etch species.