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Mark Daniel Bitner
Researcher at Air Products & Chemicals
Publications - 20
Citations - 773
Mark Daniel Bitner is an academic researcher from Air Products & Chemicals. The author has contributed to research in topics: Ultraviolet light & Dielectric. The author has an hindex of 8, co-authored 20 publications receiving 771 citations.
Papers
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Patent
Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure
Aaron Scott Lukas,Mark Leonard O'neill,Jean Louise Vincent,Raymond Nicholas Vrtis,Mark Daniel Bitner,Eugene Joseph Karwacki +5 more
TL;DR: In this paper, an organosilicate glass film is exposed to an ultraviolet light source wherein the film after exposure has an at least 10% or greater improvement in its mechanical properties compared to the as-deposited film.
Patent
Non-thermal process for forming porous low dielectric constant films
Aaron Scott Lukas,Mark Leonard O'neill,Mark Daniel Bitner,Jean Louise Vincent,Raymond Nicholas Vrtis,Eugene Joseph Karwacki +5 more
TL;DR: In this paper, a low-temperature process to remove at least a portion of at least one pore-forming phase within a multiphasic film and forming a porous film is described.
Patent
Materials and methods of forming controlled void
Raymond Nicholas Vrtis,Dingjun Wu,Mark Leonard O'neill,Mark Daniel Bitner,Jean Louise Vincent,Eugene Joseph Karwacki,Aaron Scott Lukas +6 more
TL;DR: In this paper, the authors present a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial materials precursor; removing the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificialmaterial and provide the air gaps within the substrate.
Patent
Method for removing a residue from a chamber
Raymond Nicholas Vrtis,Aaron Scott Lukas,Mark Leonard O'neill,Mark Daniel Bitner,Xiang Xiaohai,Eugene Joseph Karwacki +5 more
TL;DR: In this article, a method for removing a residue from a surface is described, which includes: providing a chamber containing the surface coated with the residue, providing in the chamber a cleaning composition of an oxidizing gas and optionally an organic species; and irradiating the cleaning composition with ultraviolet light to remove the residue from the surface.
Patent
Cleaning CVD chambers following deposition of porogen-containing materials
TL;DR: In this paper, a process for cleaning equipment surfaces in a semiconductor material processing chamber after deposition of a porous film containing a porogen was described, which involved contacting the equipment surfaces with a proton donor containing atmosphere to react with the porogen.