M
Masayuki Mori
Researcher at University of Toyama
Publications - 64
Citations - 516
Masayuki Mori is an academic researcher from University of Toyama. The author has contributed to research in topics: Substrate (electronics) & Resonant-tunneling diode. The author has an hindex of 9, co-authored 64 publications receiving 470 citations.
Papers
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Journal ArticleDOI
Microstructure and H2 gas sensing properties of undoped and Pd-doped SnO2 nanowires
Yanbai Shen,Toshinari Yamazaki,Zhifu Liu,Dan Meng,Toshio Kikuta,Noriyuki Nakatani,M. Saito,Masayuki Mori +7 more
TL;DR: In this paper, the morphology, crystal structure, and H2 gas sensing properties of undoped and Pd-doped tin oxide (SnO2) nanowires were investigated.
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Heteroepitaxial growth of InSb films on a Si(0 0 1) substrate via AlSb buffer layer
TL;DR: In this paper, the InSb films grown on the AlSb/Si(0, 0, 1) substrates by the co-evaporation of elemental indium (In) and antimony (Sb) sources were characterized as a function of growth temperature.
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Heteroepitaxial growth of rotated InSb films on a Si(1 1 1) substrate via 2×2-In surface reconstruction
Masayuki Mori,M. Saito,Y. Yamashita,K. Nagashima,M. Hashimoto,Chiei Tatsuyama,Toyokazu Tambo +6 more
TL;DR: In this paper, a two-step growth procedure in an ultra-high vacuum (UHV) chamber was used to grow InSb films via In-induced surface reconstructions such as 2×2-In and √3×√3-In on a Si(1.1) substrate.
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Heteroepitaxial growth of InSb on Si(001) surface via Ge buffer layers
TL;DR: InSb was grown on the Si, Ge, and Ge Si(001) substrates by the coevaporation of elemental In and Sb sources, and the thickness of grown InSb films was about 0.8-1.2 µm.
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Effect of AlSb buffer layer thickness on heteroepitaxial growth of InSb films on a Si(001) substrate
TL;DR: Aluminum antimonide (AlSb) layers with various thickness ranged from about 8 to 250nm were grown at 520°C as the buffer layer for the heteroepitaxial growth of InSb films on Si(001) substrates as mentioned in this paper.