scispace - formally typeset
M

Max Kneiß

Researcher at Leipzig University

Publications -  37
Citations -  819

Max Kneiß is an academic researcher from Leipzig University. The author has contributed to research in topics: Pulsed laser deposition & Thin film. The author has an hindex of 11, co-authored 30 publications receiving 511 citations.

Papers
More filters
Journal ArticleDOI

Transparent flexible thermoelectric material based on non-toxic earth-abundant p-type copper iodide thin film.

TL;DR: The superior room-temperature thermoelectric performance of p-type transparent copper iodide (CuI) thin films is presented and opens a path for multifunctional technologies combing transparent electronics, flexible electronics and thermoeLECTricity.
Journal ArticleDOI

Room-temperature Domain-epitaxy of Copper Iodide Thin Films for Transparent CuI/ZnO Heterojunctions with High Rectification Ratios Larger than 10 9

TL;DR: The obtained epitaxial thin film heterojunction of p-CuI(111)/n-ZnO(00.1) exhibits a high rectification up to 2 × 109 (±2 V), a 100-fold improvement compared to diodes with disordered interfaces.
Journal ArticleDOI

Tin-assisted heteroepitaxial PLD-growth of κ-Ga2O3 thin films with high crystalline quality

TL;DR: In this article, the structural quality of the orthorhombic Ga2O3 thin film was studied based on the growth parameters employing X-ray diffraction 2θ-ω scans, rocking curves, ϕ scans, and reciprocal space maps.
Journal ArticleDOI

Heteroepitaxial growth of α-, β-, γ- and κ-Ga2O3 phases by metalorganic vapor phase epitaxy

TL;DR: Improved MOVPE growth conditions for the different Ga2O3 phases are reported in this paper, where the influence of the substrate material, the growth conditions and the variation of precursors on the phase formation is investigated.
Journal ArticleDOI

Structural, optical, and electrical properties of orthorhombic κ -(In x Ga 1-x ) 2 O 3 thin films

TL;DR: In this article, material properties of orthorhombic κ-phase (InxGa1−x)2O3 thin films grown on a cplane sapphire substrate by pulsed-laser deposition are reported for an indium content up to x ∼ 0.35.