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Maxim Shusteff

Researcher at Lawrence Livermore National Laboratory

Publications -  57
Citations -  3014

Maxim Shusteff is an academic researcher from Lawrence Livermore National Laboratory. The author has contributed to research in topics: Lithography & Chemistry. The author has an hindex of 13, co-authored 48 publications receiving 2136 citations. Previous affiliations of Maxim Shusteff include Stanford University & Massachusetts Institute of Technology.

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Ultralight, ultrastiff mechanical metamaterials

TL;DR: A class of microarchitected materials that maintain a nearly constant stiffness per unit mass density, even at ultralow density is reported, which derives from a network of nearly isotropic microscale unit cells with high structural connectivity and nanoscale features, whose structural members are designed to carry loads in tension or compression.
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Volumetric additive manufacturing via tomographic reconstruction

TL;DR: This work demonstrated concurrent printing of all points within a three-dimensional object by illuminating a rotating volume of photosensitive material with a dynamically evolving light pattern and developed models to describe speed and spatial resolution capabilities and demonstrated printing times of 30 to 120 seconds for diverse centimeter-scale objects.
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Calcium-sensitive MRI contrast agents based on superparamagnetic iron oxide nanoparticles and calmodulin

TL;DR: A family of calcium indicators for magnetic resonance imaging (MRI), formed by combining a powerful iron oxide nanoparticle-based contrast mechanism with the versatile calcium-sensing protein calmodulin and its targets, may be useful for functional molecular imaging of biological signaling networks in live, opaque specimens.
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One-step volumetric additive manufacturing of complex polymer structures

TL;DR: A new volumetric additive fabrication paradigm is introduced that produces photopolymer structures with complex nonperiodic three-dimensional geometries on a time scale of seconds, indicating that low- absorbing resins containing ~0.1% photoinitiator may be successfully used to build full structures in ~1 to 10 s.
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Highly Tunable Thiol-Ene Photoresins for Volumetric Additive Manufacturing.

TL;DR: This study presents the first report of VAM-printed thiol-ene resins, establishing the first comprehensive framework for spatial-temporal control over volumetric energy distribution by means of tomographicvolumetric VAM.