Mineo Nomoto

TL;DR: In this article, a laser beam is concentrated using an objective lens and radiated on amorphous silicon film or polycrystalline silicon film having a grain size of one micron or less, the laser beam being processed from a continuous wave laser beam (1) to be pulsed using an EO modulator and to have arbitrary temporal energy change while pulsing ; (2) to have an arbitrary spatial energy distribution using a beamhomogenizer, filter having an arbitrary transmittance distribution, and rectangular slit; and (3) to eliminate coherency thereof using

TL;DR: A light exposure device and a method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposed surface and deforming means for imparting a force to the back surface to deform the substrate as discussed by the authors.

TL;DR: In this paper, a pattern checking mechanism is used to detect candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.

TL;DR: In this article, a method for high-precision measurement of film thickness and the distribution of the film thickness of a transparent film is presented. But the method is performed during a CMP process, and it is not affected by the thickness distribution among the LSI regions or on the semiconductor wafer surface.

TL;DR: In this article, the active region of the thin-film transistor making up the driver circuit is obtained by reformation implemented by scanning the continuous-wave laser light, condensed into a linear form or a rectangle form extremely longer in the longitudinal direction than in the transverse direction.