M
Mikio Hongo
Researcher at Hitachi
Publications - 170
Citations - 2109
Mikio Hongo is an academic researcher from Hitachi. The author has contributed to research in topics: Laser & Thin film. The author has an hindex of 25, co-authored 170 publications receiving 2109 citations. Previous affiliations of Mikio Hongo include Panasonic & Renesas Electronics.
Papers
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Patent
Laser annealing apparatus, TFT device and annealing method of the same
Mikio Hongo,Sachio Uto,Mineo Nomoto,Toshihiko Nakata,Mutsuko Hatano,Shinya Yamaguchi,Makoto Ohkura +6 more
TL;DR: In this article, a laser beam is concentrated using an objective lens and radiated on amorphous silicon film or polycrystalline silicon film having a grain size of one micron or less, the laser beam being processed from a continuous wave laser beam (1) to be pulsed using an EO modulator and to have arbitrary temporal energy change while pulsing ; (2) to have an arbitrary spatial energy distribution using a beamhomogenizer, filter having an arbitrary transmittance distribution, and rectangular slit; and (3) to eliminate coherency thereof using
Patent
Semiconductor integrated circuit device and process for producing the same
Takahashi Takahiko,Funikazu Itoh,Akira Shimase,Hiroshi Yamaguchi,Mikio Hongo,Haraichi Satoshi +5 more
TL;DR: In this article, a hole is bored in an insulating film above a portion of a wiring which is to be connected to another wiring by means of a focused ion beam, and a predetermined region is irradiated with either a laser beam or an ion beam in a metal compound gas to deposit metal in the hole and on said region and a connecting wiring is formed by using optically pumped CVD.
Patent
Ion beam processing apparatus and method of correcting mask defects
TL;DR: In this paper, an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source which operates in ultra-low temperature, confronting the specimen chamber, an extraction electrode for extracting ion beam out of the ion source and a charged-particle optical system for focusing the ion beam to a spot, and an aperture for adjusting the spot diameter.
Patent
Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof
Maruyama Shigenobu,Mikio Hongo,Todoroki Satoru,Masaaki Okunaka,Hideo Matsuzaki,Takanori Ninomiya,Kazushi Yoshimura,Ito Fumikazu +7 more
TL;DR: In this paper, a method and apparatus for inspecting wirings of an electronic circuit substrate to detect a defect in the wiring and for enabling correction thereof is presented, which includes electrostatically coupling at least one electrode to a wiring pattern, applying a time varying voltage between the electrode and wiring pattern at different locations, and determining a defect by a variation in the detected current flow at the different locations and a portion of the defect.
Patent
Method and apparatus for correcting delicate wiring of IC device
TL;DR: In this paper, a method and apparatus for correcting a device characterized in that an ion beam is extracted from an ion source having high luminance such as a liquid metal ion source or the like, the ion beam was then converged to a delicate spot by use of a charged particle optical system and apertures.