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Mikio Hongo

Researcher at Hitachi

Publications -  170
Citations -  2109

Mikio Hongo is an academic researcher from Hitachi. The author has contributed to research in topics: Laser & Thin film. The author has an hindex of 25, co-authored 170 publications receiving 2109 citations. Previous affiliations of Mikio Hongo include Panasonic & Renesas Electronics.

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Patent

Laser annealing apparatus, TFT device and annealing method of the same

TL;DR: In this article, a laser beam is concentrated using an objective lens and radiated on amorphous silicon film or polycrystalline silicon film having a grain size of one micron or less, the laser beam being processed from a continuous wave laser beam (1) to be pulsed using an EO modulator and to have arbitrary temporal energy change while pulsing ; (2) to have an arbitrary spatial energy distribution using a beamhomogenizer, filter having an arbitrary transmittance distribution, and rectangular slit; and (3) to eliminate coherency thereof using
Patent

Semiconductor integrated circuit device and process for producing the same

TL;DR: In this article, a hole is bored in an insulating film above a portion of a wiring which is to be connected to another wiring by means of a focused ion beam, and a predetermined region is irradiated with either a laser beam or an ion beam in a metal compound gas to deposit metal in the hole and on said region and a connecting wiring is formed by using optically pumped CVD.
Patent

Ion beam processing apparatus and method of correcting mask defects

TL;DR: In this paper, an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source which operates in ultra-low temperature, confronting the specimen chamber, an extraction electrode for extracting ion beam out of the ion source and a charged-particle optical system for focusing the ion beam to a spot, and an aperture for adjusting the spot diameter.
Patent

Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof

TL;DR: In this paper, a method and apparatus for inspecting wirings of an electronic circuit substrate to detect a defect in the wiring and for enabling correction thereof is presented, which includes electrostatically coupling at least one electrode to a wiring pattern, applying a time varying voltage between the electrode and wiring pattern at different locations, and determining a defect by a variation in the detected current flow at the different locations and a portion of the defect.
Patent

Method and apparatus for correcting delicate wiring of IC device

TL;DR: In this paper, a method and apparatus for correcting a device characterized in that an ion beam is extracted from an ion source having high luminance such as a liquid metal ion source or the like, the ion beam was then converged to a delicate spot by use of a charged particle optical system and apertures.