Oleg A. Ershov

TL;DR: The gratings produced by the method are of sufficient quality for use in high-resolution spectrographs in the visible and near IR (lambda approximately = 500-5000 nm) and are measured to have peak diffraction efficiencies at lambda = 632.8 nm.

TL;DR: In this article, the authors presented validation results for the aerosol optical thickness derived by applying a two-channel retrieval algorithm to Advanced Very High Resolution Radiometer (AVHRR) radiance data.

TL;DR: Micromachined silicon gratings offer two great advantages to astronomical spectroscopy in the IR: (1) photolithographic processing techniques permit the production of gratings with much larger groove constants than are possible with conventional wavelength coverage, despite the relatively small format of IR arrays; and (2) one can use anisotropic etching to form gratings on dielectric wedges. as mentioned in this paper discusses the technical challenges involved in micromachining large grating grooves over large areas while holding positional accuracy to very tight tolerances.

TL;DR: In this paper, the authors used anistropic etching techniques to produce diffraction gratings on bulky silicon substrates, which can serve as high resolution grisms (when used in transmission), as coarse front-surface gratings, or as very high resolution immersion gratings.

TL;DR: In this article, the first Si-based surface-relief polygonal gratings aiming at optical clock signal distribution application were fabricated using reactive ion beam etching (RIE).