Atmospheric pressure plasmas: A review

Gas discharge plasmas and their applications

Reactive species in non-equilibrium atmospheric-pressure plasmas: Generation, transport, and biological effects

Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012 consisting of the individual perspectives of 16 leading experts in the various sub-fields of low temperature plasma science and technology. The 2017 Plasma Roadmap is the first update of a planned series of periodic updates of the Plasma Roadmap. The continuously growing interdisciplinary nature of the low temperature plasma field and its equally broad range of applications are making it increasingly difficult to identify major challenges that encompass all of the many sub-fields and applications. This intellectual diversity is ultimately a strength of the field. The current state of the art for the 19 sub-fields addressed in this roadmap demonstrates the enviable track record of the low temperature plasma field in the development of plasmas as an enabling technology for a vast range of technologies that underpin our modern society. At the same time, the many important scientific and technological challenges shared in this roadmap show that the path forward is not only scientifically rich but has the potential to make wide and far reaching contributions to many societal challenges.

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The 2017 Plasma Roadmap: Low temperature plasma science and technology

Over the last ten years, expansion of atmospheric pressure plasma solutions for surface treatment of materials has been remarkable, however direct plasma technology for thin film deposition needs still great effort. The objective of this paper is to establish the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) a viable option for industrial application. Basic scientific principles to understand and optimize an AP-PECVD process are summarized. Laboratory reactor configurations are reviewed. Reference points for the design and use of AP-PECVD reactors according to the desired thin film properties are given. Finally, solutions to avoid powder formation and to increase the thin film growth rate are discussed.

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Dielectric barrier discharges (DBDs) at atmospheric pressure are obtained using mixtures of He and Ar as carrier gasses and various reactive additives such as hydrocarbons, hydrogen and nitrogen. These DBDs are used in three applications: deposition of polymer films; cleaning of Ag and Cu substrates; and activation of polyurethane and steel surfaces. In the case of the film deposition, several process conditions are investigated and the resulting films are analysed by scanning electron microscope, Fourier transform infrared spectroscopy and NMR. In another series of experiments Ag and Cu surfaces, covered with sulfide and oxide layers, are treated by means of a DBD in helium or argon with hydrogen added. The surfaces are analysed with X-ray photoelectron spectroscopy. Finally, a He–N2 plasma is used as an activator of polyurethane.

Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation.

Hybrid organic-inorganic precursors and sol-gel systems thereof, obtained via wet-chemical hydrolysis, were atomized and introduced into an atmospheric pressure dielectric barrier discharge (DBD) in nitrogen. The precursors used are tetraethoxysilane (TEOS), glycidoxypropyltrimethoxysilane (GLYMO), methacryloxypropyltrimethoxysilane (MEMO), propyltrimethoxysilane (PTMO), and a new high molecular weight siloxane precursor (Bayrecit). The obtained coatings were analyzed by means of Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and field emission scanning electron microscopy (FESEM). Deposition rates varied between 30 nm min -1 and 175 nm min -1 . Injection of hydrolized sol-gel precursor systems resulted in higher deposition rates. Films deposited on PET foil were tested for their oxygen barrier properties. Plasma-assisted coating deposition of the sol-gel systems proved to be superior to wet-chemical application and conventional thermal or UV curing. However, the best barrier performance was obtained with a coating from non-hydrolyzed Bayrecit. The lowest oxygen transmission rate (OTR) on PET obtained so far is 5 cm 3 m -2 day -1 bar -1 .

Aerosol‐Assisted Plasma Deposition of Barrier Coatings using Organic‐Inorganic Sol‐Gel Precursor Systems

The aim of this work is to develop barrier coatings by using an atmospheric pressure dielectric barrier discharge (DBD). For this purpose the plasma polymers obtained from a hybrid organic–inorganic precursor compound as well as from a purely organic compound were compared. The physical properties of the coatings were determined by scanning electron microscopy and scanning probe microscopy analysis as well as by profilometry and by determining their oxygen transmission rates. The chemical structure was revealed by ATR-FTIR analysis and 13C- and 29Si-CP/MAS solid-state nuclear magnetic resonance measurements. It is shown that atmospheric pressure plasma polymerization of hybrid polymer precursors leads to coatings with excellent barrier properties due to the unique synergistic effect of the organic and the inorganic network structures that are formed in the plasma.

https://iopscience.iop.org/article/10.1088/0022-3727/38/4/008/pdf

Physical and chemical properties of hybrid barrier coatings obtained in an atmospheric pressure dielectric barrier discharge

Both a hybrid organic–inorganic monomer and a purely organic monomer were atomized and introduced in an atmospheric pressure dielectric barrier discharge (DBD), with the aim of evaluating the barrier properties of the coatings obtained. After thorough analysis, the barrier properties of the plasma polymers were related to their physical and chemical properties. The physical properties of the coatings were determined by SEM-analysis as well as by profilometry. The chemical structure was revealed by 13 C- and 29 Si-CP/MAS solid-state NMR measurements and ATR-FTIR analysis. It was shown that atmospheric pressure plasma polymerization of hybrid polymer precursors leads to coatings with excellent barrier properties due to the unique synergistic effect of the organic and the inorganic network structures that are formed in the plasma.

Plasma polymerization of hybrid organic–inorganic monomers in an atmospheric pressure dielectric barrier discharge

The present invention is related to a method and apparatus for generating and maintaining a plasma by a Dielectric Barrier Discharge technique, in the space between two electrodes, whereby an alternating voltage is applied between said two electrodes, said voltage having such a profile so that one electrode is treated to a lesser degree by said plasma than the other electrode.

Olivier Goossens

Papers

Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation.

Aerosol‐Assisted Plasma Deposition of Barrier Coatings using Organic‐Inorganic Sol‐Gel Precursor Systems

Physical and chemical properties of hybrid barrier coatings obtained in an atmospheric pressure dielectric barrier discharge

Plasma polymerization of hybrid organic–inorganic monomers in an atmospheric pressure dielectric barrier discharge

Method and apparatus for generating and maintaining a plasma