P
Patrick N. Everett
Researcher at Massachusetts Institute of Technology
Publications - 24
Citations - 778
Patrick N. Everett is an academic researcher from Massachusetts Institute of Technology. The author has contributed to research in topics: Lithography & Grating. The author has an hindex of 13, co-authored 24 publications receiving 775 citations.
Papers
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Patent
Interference lithography utilizing phase-locked scanning beams
TL;DR: In this paper, a method and system of interference lithography (also known as interferometric lithography or holographic lithography) which utilizes phase-locked, scanning beams is presented.
Patent
Method and system for interference lithography utilizing phase-locked scanning beams
TL;DR: In this paper, a high-precision stage that moves a substrate under overlapped and interfering pairs of coherent beams is used to generate fringes for subsequent writing of periodic and quasi-periodic patterns on the substrate.
Journal ArticleDOI
Sub-100 nm metrology using interferometrically produced fiducials
Mark L. Schattenburg,Chenson Chen,Patrick N. Everett,J. Ferrera,Paul T. Konkola,Henry I. Smith +5 more
TL;DR: In this paper, the authors explore the limitations of laser-interferometer-based mark-detection metrology, and contrast this with ways that fiducial grids could be used to solve a variety of metrology problems, including measuring process-induced distortions in substrates, measuring patterning distortions in pattern-mastering systems, such as laser and e-beam writers; and measuring field distortions and alignment errors in steppers and scanners.
Patent
Optical interference alignment and gapping apparatus
TL;DR: In this paper, a checkerboard pattern on the second plate was used for measuring gap. But the second was used to measure gap between the first and second interference phases, and the difference between the interference phases correspond to a predetermined interference phase difference.
Patent
Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction
TL;DR: In this paper, an apparatus and method of measuring the gap between one substantially planar object, such as a mask, and a substrate was proposed, which achieved a high degree of sensitivity, accuracy, capture range, and reliability, through a novel design of a mark located only on the mask-plate.