R
Richard M. Ness
Researcher at Cymer, Inc.
Publications - 52
Citations - 2275
Richard M. Ness is an academic researcher from Cymer, Inc.. The author has contributed to research in topics: Laser & Electric discharge in gases. The author has an hindex of 25, co-authored 52 publications receiving 2271 citations.
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Patent
Extreme ultraviolet light source
Stephan T. Melnychuk,William N. Partlo,Igor V. Fomenkov,I. Roger Oliver,Richard M. Ness,Norbert R. Bowering,Oleh V. Khodykin,Curtis L. Rettig,Gerry M. Blumenstock,Timothy S. Dyer,Rodney D. Simmons,Jerzy R. Hoffman,R. Mark Johnson +12 more
TL;DR: In this paper, a very hot plasma containing an active material is produced in vacuum chamber and a pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts.
Patent
Very narrow band, two chamber, high rep rate gas discharge laser system
David S. Knowles,Daniel J. W. Brown,Herve A. Besaucele,David W. Myers,Alexander I. Ershov,William N. Partlo,Richard L. Sandstrom,Palash P. Das,Stuart L. Anderson,Igor V. Fomenkov,Richard C. Ujazdowski,Eckehard D. Onkels,Richard M. Ness,Scott T. Smith,William G Hulburd,Jeffrey Oicles +15 more
TL;DR: An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater is presented in this paper.
Patent
Reliable, modular, production quality narrow-band high rep rate F2 laser
Thomas Hofmann,Jean-Marc Hueber,Palash P. Das,Toshihiko Ishihara,Thomas P. Duffey,John T. Melchior,Herve A. Besaucele,Richard G. Morton,Richard M. Ness,Peter C. Newman,William N. Partlo,Daniel A. Rothweil,Richard L. Sandstrom +12 more
TL;DR: In this paper, the authors presented a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater with the use of a high voltage power supply with a voltage bleed-down circuit.
Patent
Plasma focus light source with improved pulse power system
TL;DR: In this article, a high energy photon source is presented in which a pair of plasma pinch electrodes are located in a vacuum chamber and a noble buffer gas and an active gas chosen to provide a desired spectral line.
Patent
Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
Toshihiko Ishihara,Thomas P. Duffey,John T. Melchior,Herve A. Besaucele,Richard G. Morton,Richard M. Ness,Peter C. Newman,William N. Partlo,Daniel A. Rothweil,Richard L. Sandstrom +9 more
TL;DR: In this paper, a modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less.