R
Richard Ritikos
Researcher at University of Malaya
Publications - 32
Citations - 508
Richard Ritikos is an academic researcher from University of Malaya. The author has contributed to research in topics: Thin film & Plasma-enhanced chemical vapor deposition. The author has an hindex of 10, co-authored 32 publications receiving 422 citations. Previous affiliations of Richard Ritikos include Solid State Physics Laboratory.
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Journal ArticleDOI
A practical carbon dioxide gas sensor using room-temperature hydrogen plasma reduced graphene oxide
Syed Muhammad Hafiz,Richard Ritikos,T J Whitcher,Nadia Md. Razib,Daniel Chia Sheng Bien,Narong Chanlek,Hideki Nakajima,T. Saisopa,Prayoon Songsiriritthigul,Nay Ming Huang,Saadah Abdul Rahman +10 more
TL;DR: In this paper, a carbon dioxide gas sensor from the room-temperature reduction of graphene oxide via hydrogen plasma was developed, where the hydrogen plasma contains radicals and atoms which give dissociation energies for oxygen functional groups, which is capable of reducing the graphene oxide.
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Wetting behaviour of carbon nitride nanostructures grown by plasma enhanced chemical vapour deposition technique
TL;DR: In this article, carbon nitride (CN x ) films were deposited on silicon (1.1) substrates using radio-frequency plasma enhanced chemical vapour deposition employing parallel plate electrode configuration.
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Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition
Maisara Othman,Richard Ritikos,Noor Hamizah Khanis,Nur Maisarah Abdul Rashid,Saadah Abdul Rahman,Siti Meriam Ab. Gani,Muhamad Rasat Muhamad +6 more
TL;DR: In this paper, the effects of rf power on the structural properties of carbon nitride (CN x ) thin films were discussed in a radio frequency plasma enhanced chemical vapour deposition (rf PECVD) technique.
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Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique
Richard Ritikos,Boon Tong Goh,Khairul Anuar Mat Sharif,Muhamad Rasat Muhamad,Saadah Abdul Rahman +4 more
TL;DR: In this paper, a-CN x :H/nc-Si:H multilayered thin films (3-11 periods) were deposited on substrates of p-type (111) crystal silicon and quartz.
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Effect of Annealing on the Optical and Chemical Bonding Properties of Hydrogenated Amorphous Carbon and Hydrogenated Amorphous Carbon Nitride Thin Films
Richard Ritikos,Chow Chee Siong,Siti Meriam Ab. Gani,Muhamad Rasat Muhamad,Saadah Abdul Rahman +4 more
TL;DR: In this paper, a-C:H and a-CNx:H were characterized using Fourier transform infrared and optical transmission spectroscopy techniques and the incorporation of nitrogen and the effect of annealing (100-500 °C) on the film properties were studied.