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Rony Snyders

Researcher at University of Mons

Publications -  269
Citations -  6423

Rony Snyders is an academic researcher from University of Mons. The author has contributed to research in topics: Sputtering & Thin film. The author has an hindex of 36, co-authored 252 publications receiving 5177 citations. Previous affiliations of Rony Snyders include University of Nantes & École Polytechnique de Montréal.

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Au nanoparticle-functionalised WO3 nanoneedles and their application in high sensitivity gas sensor devices

TL;DR: Co-deposition of Au nanoparticles with WO(3) nanoneedles has been used to deposit a sensing layer directly onto gas sensor substrates providing devices with a six-fold increase in response to low concentrations of a test analyte (ethanol).
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Optical characterization of a microwave pulsed discharge used for dissociation of CO2

TL;DR: In this paper, the authors studied the conversion of CO2 into CO and O in a flowing gas surfaguide pulsed microwave discharge operating with CO2 and CO2 + N2 gas mixtures under different conditions.
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Free-Radical-Induced Grafting from Plasma Polymer Surfaces

TL;DR: The goal of this review is to illustrate the increasing application of plasma-based technologies for tuning the surface properties of polymers, principally through free-radical chemistry.
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Room temperature responses of visible-light illuminated WO3 sensors to NO2 in sub-ppm range

TL;DR: In this article, the effects of visible-light illumination on sensing properties of tungsten trioxide (WO3) sensors have been investigated, and the results show that visible light can effectively activate the WO3 sensors and blue light is a good choice to produce room-temperature devices which are suited for NO2 sensing applications.
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Plasma diagnostics for understanding the plasma?surface interaction in HiPIMS discharges: a review

TL;DR: The physical and chemical aspects of plasma surface interaction in high-power impulse magnetron sputtering (HiPIMS) discharges are overviewed in this article, where the data obtained by various plasma diagnostic methods representing the important sputtering discharge regions, namely the cathode vicinity, plasma bulk, and substrate vicinity, are reported.