R
Rui Shu
Researcher at Linköping University
Publications - 57
Citations - 221
Rui Shu is an academic researcher from Linköping University. The author has contributed to research in topics: Microstructure & Alloy. The author has an hindex of 4, co-authored 13 publications receiving 80 citations. Previous affiliations of Rui Shu include Chinese Academy of Sciences.
Papers
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Journal ArticleDOI
Mg$_{3+\delta}$Sb$_x$Bi$_{2-x}$ family: A promising substitute for the start-of-art n-type thermoelectric materials near room temperature.
Rui Shu,Yecheng Zhou,Qi Wang,Zhijia Han,Yongbin Zhu,Yong Liu,Yuexing Chen,Meng Gu,Wei Xu,Yu Wang,Wenqing Zhang,Li Huang,Weishu Liu +12 more
TL;DR: In this paper, a Mg3+{\delta}SbxBi2-x family ((ZT)avg =1.05) was shown to be a promising substitute for the Bi2Te3-xSex family in the temperature range of 50-250 °C based on the comparable thermoelectric performance.
Journal ArticleDOI
Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)Nx coatings
Rui Shu,Eirini-Maria Paschalidou,Smita Gangaprasad Rao,Jun Lu,Grzegorz Greczynski,Erik Lewin,Leif Nyholm,Arnaud le Febvrier,Per Eklund +8 more
TL;DR: A series of (TiNbZrTa)Nx coatings with a thickness of 1.1μm were deposited using reactive magnetron sputtering with segmented targets as discussed by the authors.
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One-step synthesis of polycrystalline V2AlC thin films on amorphous substrates by magnetron co-sputtering
TL;DR: In this paper, the authors used magnetron co-sputtering at 600°C to synthesize polycrystalline MAX-phase V 2 AlC on amorphous substrates.
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Hard and wear resistant VB2 coatings deposited by pulsed DC magnetron sputtering
TL;DR: In this article, the effect of deposition parameters on the microstructure, mechanical and tribological properties of vanadium boride (VB 2 ) coatings were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), TEM, nano-and micro-indentation, and ball-on-disk tribometer.
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Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)Nx films
Rui Shu,Eirini-Maria Paschalidou,Smita Gangaprasad Rao,Babak Bakhit,Robert D. Boyd,Marcos V. Moro,Daniel Primetzhofer,Grzegorz Greczynski,Leif Nyholm,Arnaud le Febvrier,Per Eklund +10 more
TL;DR: In this article, multi-component (TiNbZrTa)Nx films were deposited on Si(100) substrates at room temperature using magnetron sputtering with a nitrogen flow ratio fN [fN = N2/(Ar + N2]], which was varied from 0 to 3...