Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon precursor. The characterization of deposited film on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bellows with 0.1 μm dimension were fabricated as parts of the microsystem. Furthermore, microstructure plastic arts is advocated as a new field using microbeam technology, presenting one example of a microwine glass with 2.75 μm external diameter and 12 μm height.

Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

A direct, accurate and convenient procedure for calibrating the spring constants of probes used for force microscopy/spectroscopy is described. It amounts to deflecting an 'unknown' cantilever with a 'standard' lever, where the standard lever has been precalibrated. The absolute and relative accuracies of the procedure are ±20-30% and ±10-20%, respectively; the former is limited by uncertainties in the determination of the spring constant for the 'standard' lever, as well as that for the 'unknown'. The method differs from others of the static deflection variety by its exploitation of the routine features of current instruments. The technique is compared with other static and dynamic methods currently being used.

https://iopscience.iop.org/article/10.1088/0957-4484/7/3/014/pdf

Determination of the spring constants of probes for force microscopy/spectroscopy

The preparation of transmission electron microscopy cross-section specimens using focused ion beam milling is outlined. The “liftout” and “trench” techniques are both described in detail, and their relative advantages and disadvantages are discussed. Artifacts such as ion damage to the top surface and sidewalls of the cross-section specimens, and methods of reducing them, are addressed.

Preparation of transmission electron microscopy cross-section specimens using focused ion beam milling

Superconducting nanowires, with a critical temperature of 5.2K, have been synthesized using an ion-beam-induced deposition, with a gallium focused ion beam and tungsten carboxyl, W(CO)6, as precursor. The films are amorphous, with atomic concentrations of about 40%, 40%, and 20% for W, C, and Ga, respectively, 0K values of the upper critical field and coherence length of 9.5T and 5.9nm, respectively, are deduced from the resistivity data at different applied magnetic fields. The critical current density is Jc=1.5×105A∕cm2 at 3K. This technique can be used as a template-free fabrication method for superconducting devices.

Focused-ion-beam-induced deposition of superconducting nanowires

The Young’s modulus of diamond-like carbon (DLC) pillars was measured by means of mechanical vibration using scanning electron microscopy. The DLC pillars were grown using Ga+ focused ion beam-induced chemical vapor deposition with a precursor of phenanthrene vapor. The Young’s modulus of the DLC pillars was around 100 GPa at vapor pressure of 5×10−5 Pa and it had a quality (Q) value of resonance exceeding 1200. There seemed to be a balance between the DLC growth rate and surface bombardment by the ions, and this played an important role in the stiffness of the pillars. Some of the DLC pillars showed a very large Young’s modulus over 600 GPa at low gas pressure conditions.

Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition

The application of focused ion beams to the repair of defects in x‐ray masks is described. An image of the defective region on the mask is obtained using the ion beam in a manner analogous to a scanning electron microscope. Opaque defects are removed by physical sputtering of extra absorber. Clear defects are repaired by ion‐beam‐induced decomposition of an organometallic compound to form an opaque film on the substrate. Examples illustrating the repair process and demonstrating submicron spatial resolution are presented. The effect of ion channeling on imaging and opaque repair is also described.

S. J. Kirch

Papers

X‐ray mask repair with focused ion beams