Nanoscale zero valent supported by Zeolite and Montmorillonite: Template effect of the removal of lead ion from an aqueous solution

The article reports on flexible hard nanocomposite coatings prepared by magnetron sputtering. It is shown that the flexible hard nanocomposite coatings (i) represent a new class of coatings which are simultaneously hard, tough and resistant to cracking, (ii) exhibit high values of the hardness H and effective Young's modulus E* ratio H/E* ≥ 0.1, elastic recovery We ≥ 60%, compressive macrostress σ < 0 and dense, void-free microstructures, and (iii) are formed in the zone T of the Thornton's Structural Zone Model (SZM); here E* = E/(1 − ν2), E is the Young's modulus and ν is the Poisson's ratio. The magnetron sputtering, which is a very powerful process used in the preparation of nanocomposite coatings, is described in detail. The basic principles of the formation of the flexible hard coatings are also described in detail. It is shown that the key parameters which determine the formation of these coatings are (1) the energy Ep = Eca + Ebi delivered to the growing coating by condensing atoms (Eca) and bombarding ions (Ebi) (the non-equilibrium heating), (2) the substrate heating controlled by the substrate temperature Ts (the equilibrium heating) and (3) the melting temperature Tm of the coating material. The flexible hard coatings have a huge application potential. Four examples of flexible coatings are given: (1) flexible protective coatings, (2) flexible functional coatings, (3) flexible over-layer preventing cracking of brittle coating and (4) flexible multilayer coating. Also, the principle of low-temperature sputtering of flexible nanocomposite coatings is described in detail. Finally, trends for future development of these nanocomposite coatings with unique properties are given.

Flexible hard nanocomposite coatings

https://hal-univ-rennes1.archives-ouvertes.fr/hal-01202033/document

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Zr–B–C–N films were deposited on silicon and glass substrates using pulsed magnetron co-sputtering of a single B 4 C–Zr target (at 15% or 45% of zirconium in the target erosion area) in nitrogen–argon gas mixtures. A planar unbalanced magnetron was driven by a pulsed dc power supply operating at a repetition frequency of 10 kHz with a fixed 85% duty cycle. The total pressure was 0.5 Pa and the substrate temperature was adjusted to 450 °C during the depositions on the substrates at a floating potential. High-quality defect-free films, 3.5 to 4.1 μm thick, with smooth surfaces (the average roughness R a  ≤ 4 nm) and good adhesion to substrates at low compressive stresses (less than 0.9 GPa) were produced. Hard (37 GPa) nanocolumnar ZrB 2 -type films of the Zr 25 B 57 C 14 N 3 composition (in at.% without 1 at.% of hydrogen) with a very low compressive stress (0.4 GPa), high electrical conductivity (electrical resistivity of 2.3 × 10 − 6  Ωm) and high oxidation resistance in air up to 650 °C were prepared in pure argon at a 15% Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr 41 B 30 C 8 N 20 films with a low compressive stress (0.6 GPa), even higher electrical conductivity (electrical resistivity of 1.7 × 10 − 6  Ωm) and high oxidation resistance in air up to 550 °C were deposited in a 5% N 2  + 95% Ar gas mixture at a 45% Zr fraction in the target erosion area. Increasing the N 2 fraction (> 5%) in the gas mixture resulted in a significant decrease of the film hardness and in a rapid rise in their electrical resistivity and oxidation resistance in air at elevated temperatures due to a growing volume fraction of an amorphous phase with a high content of nitrogen (up to 52 at.%) in the materials.

Š. Prokšová

Papers

Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering

Antibacterial Cr–Cu–O films prepared by reactive magnetron sputtering

Hard nanocrystalline Zr–B–C–N films with high electrical conductivity prepared by pulsed magnetron sputtering