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S. Uthanna

Researcher at Sri Venkateswara University

Publications -  168
Citations -  2932

S. Uthanna is an academic researcher from Sri Venkateswara University. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 31, co-authored 168 publications receiving 2656 citations. Previous affiliations of S. Uthanna include Mines ParisTech.

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Preparation and characterization of CdO films deposited by dc magnetron reactive sputtering

TL;DR: In this article, the dc magnetron reactive sputtering of cadmium in an oxygen and argon atmosphere has been studied for their structural, electrical and optical properties, showing resistivity of 4.6×10−3 Ω cm, Hall mobility of 53 cm2/V s, carrier concentration of 3.5×1019 cm−3, with an optical transmission of 85% in the wavelength range 600-1600 nm and with a band gap of 2.46 eV.
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Physical Properties of Zinc Oxide Films Prepared by dc Reactive Magnetron Sputtering at Different Sputtering Pressures

TL;DR: In this article, the effect of sputtering pressure on the structural, electrical and optical properties of polycrystalline zinc oxide films was systematically studied and it was shown that the grain boundary scattering of the charge carriers is predominant in these films.
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Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films

TL;DR: In this article, the influence of substrate temperature on the chemical binding configuration, crystal structure and optical properties of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K.
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Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films

TL;DR: In this article, the influence of sputtering power on the structural, electrical and optical properties of polycrystalline films was systematically studied, and the results showed that the films formed at sputtering powers ≤ 0.76 and 1.08 were mixed phase of Cu2O and CuO, respectively.
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Effect of annealing temperature on the properties of spray deposited Cu2SnS3 thin films

TL;DR: In this paper, the effect of annealing Cu2SnS3 (CTS) films in sulphur atmosphere at different annoaling temperatures was investigated, and it was observed that the films exhibit polymorphism with tetragonal and monoclinic CTS phases.