Broadband and low loss capability of photonics has led to an ever-increasing interest in its use for the generation, processing, control and distribution of microwave and millimeter-wave signals for applications such as broadband wireless access networks, sensor networks, radar, satellite communitarians, instrumentation and warfare systems. In this tutorial, techniques developed in the last few years in microwave photonics are reviewed with an emphasis on the systems architectures for photonic generation and processing of microwave signals, photonic true-time delay beamforming, radio-over-fiber systems, and photonic analog-to-digital conversion. Challenges in system implementation for practical applications and new areas of research in microwave photonics are also discussed.

Microwave Photonics

Colour and spectral imaging systems typically use filters and glass prisms to disperse light of different wavelengths. With the miniaturization of integrated devices, current research on imaging sensors focuses on novel designs aiming at high efficiency, low power consumption and slim dimension, which poses great challenges to the traditional colourant-based filtering and prism-based spectral splitting techniques. In this context, surface plasmon-based nanostructures are attractive due to their small dimensions and the ability to efficiently manipulate light. In this article we use selective conversion between free-space waves and spatially confined modes in plasmonic nanoresonators formed by subwavelength metal-insulator-metal stack arrays to show that the transmission spectra through such arrays can be well controlled by using simple design rules, and high-efficiency colour filters capable of transmitting arbitrary colours can be achieved. These artificial nanostructures provide an approach for high spatial resolution colour filtering and spectral imaging with extremely compact device architectures.

/pdf/plasmonic-nanoresonators-for-high-resolution-colour-3d8exswxiu.pdf

Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging

Micro- and nanopatterning techniques for organic electronic and optoelectronic systems.

Plasmonic colours are structural colours that emerge from resonant interactions between light and metallic nanostructures. The engineering of plasmonic colours is a promising, rapidly emerging research field that could have a large technological impact. We highlight basic properties of plasmonic colours and recent nanofabrication developments, comparing technology-performance indicators for traditional and nanophotonic colour technologies. The structures of interest include diffraction gratings, nanoaperture arrays, thin films, and multilayers and structures that support Mie resonances and whispering-gallery modes. We discuss plasmonic colour nanotechnology based on localized surface plasmon resonances, such as gap plasmons and hybridized disk–hole plasmons, which allow for colour printing with sub-diffraction resolution. We also address a range of fabrication approaches that enable large-area printing and nanoscale lithography compatible with complementary metal-oxide semiconductor technologies, including nanoimprint lithography and self-assembly. Finally, we review recent developments in dynamically reconfigurable plasmonic colours and in the laser-induced post-processing of plasmonic colour surfaces. Plasmonic colours can be used to colour large surfaces, can be mass-produced and dynamically reconfigured, and can provide sub-diffraction resolution. In this Review, basic properties of plasmonic colours, different platforms supporting them and recent developments in the field are discussed.

Plasmonic colour generation

Microwave photonics is an area that studies the generation, processing, control and transmission of microwave signals by means of photonics. In this paper, microwave photonics techniques developed in the past few years will be reviewed, with an emphasis on system architectures for microwave applications.

http://ieeexplore.ieee.org/iel5/6305327/6320324/06320333.pdf

Microwave photonics

A color filter incorporating a subwavelength patterned grating in a metal film perforated with a square array of circular apertures on a quartz substrate was accomplished. Its performance was enhanced by applying a dielectric overlay to the grating layer so as to match the refractive indices of the media on either side of it. The device was designed by utilizing the finite-difference time-domain method and implemented by adopting the electron-beam direct-writing technique. Two different devices were fabricated with the structural parameters: the grating height of 50 nm and the pitch of 340 nm for the red color and 260 nm for the green color. For the red color filter the center wavelength was 680 nm and the peak transmission 57%, while for the green color one the center wavelength was 550 nm and the peak transmission 50%. It was confirmed the introduction of the index matching overlay led to an increase of ~15% in the transmission efficiency and helped combine double bands into a single dominant band as well, thereby improving the color selectivity of the filter.

Color filter based on a subwavelength patterned metal grating

Nanophotonic devices enabled by aluminum plasmonics are saliently advantageous in terms of their low cost, outstanding sustainability, and affordable volume production. We report, for the first time, aluminum plasmonics based highly transmissive polarization-independent subtractive color filters, which are fabricated just with single step electron-beam lithography. The filters feature selective suppression in the transmission spectra, which is realized by combining the propagating and nonpropagating surface plasmons mediated by an array of opaque and physically thin aluminum nanopatches. A broad palette of bright, high-contrast subtractive colors is successfully demonstrated by simply varying the pitches of the nanopatches. These subtractive color filters have twice the photon throughput of additive counterparts, ultimately providing elevated optical transmission and thus stronger color signals. Moreover, the filters are demonstrated to conspicuously feature a dual-mode operation, both transmissive and reflective, in conjunction with a capability to exhibit micron-scale colors in arbitrary shapes. They are anticipated to be diversely applied to digital display, digital imaging, color printing, and sensing.

Aluminum plasmonics based highly transmissive polarization-independent subtractive color filters exploiting a nanopatch array

An ultra-small integrated photonic temperature sensor has been proposed and demonstrated which incorporates a silicon ring resonator linked to a vertical grating coupler. It was manufactured using a 0.18 μm standard CMOS process, rendering a homogeneous integration into other electrical/optical devices. The temperature variation was measured by monitoring the shift in the resonant wavelength of the silicon resonator, which was induced by the thermo-optic effect and the thermal expansion effect. The dependence of its sensing capability upon the waveguide width of the resonator was intensively probed both theoretically and experimentally. The best achieved sensitivity was about 83 pm/°C for a waveguide width of 500 nm, while the sensitivity was boosted by ~10 pm/°C by adjusting the waveguide width from 300 nm to 500 nm. Finally, the response speed of the sensor was as fast as ~6 μs.

Silicon photonic temperature sensor employing a ring resonator manufactured using a standard CMOS process

It is advantageous to construct a dielectric metasurface in silicon due to its compatibility with cost-effective, mature processes for complementary metal-oxide-semiconductor devices. However, high-quality crystalline-silicon films are difficult to grow on foreign substrates. In this work, we propose and realize highly efficient structural color filters based on a dielectric metasurface exploiting hydrogenated amorphous silicon (a-Si:H), known to be lossy in the visible regime. The metasurface is comprised of an array of a-Si:H nanodisks embedded in a polymer, providing a homogeneously planarized surface that is crucial for practical applications. The a-Si:H nanodisk element is deemed to individually support an electric dipole (ED) and magnetic dipole (MD) resonance via Mie scattering, thereby leading to wavelength-dependent filtering characteristics. The ED and MD can be precisely identified by observing the resonant field profiles with the assistance of finite-difference time-domain simulations. The completed color filters provide a high transmission of around 90% in the off-resonance band longer than their resonant wavelengths, exhibiting vivid subtractive colors. A wide range of colors can be facilitated by tuning the resonance by adjusting the structural parameters like the period and diameter of the a-Si:H nanodisk. The proposed devices will be actively utilized to implement color displays, imaging devices, and photorealistic color printing.

/pdf/structural-color-filters-enabled-by-a-dielectric-metasurface-23fbfllv5v.pdf

Structural Color Filters Enabled by a Dielectric Metasurface Incorporating Hydrogenated Amorphous Silicon Nanodisks.

A color filter based on a subwavelength patterned grating in poly silicon was proposed and realized on a quartz substrate. It was produced by utilizing the laser interference lithography technique to feature wide effective area compared to the costly e-beam lithography. An oxide layer was introduced on top of the silicon grating layer as a mask to facilitate the silicon-etching and to enhance the filtering selectivity as well. The structural parameters for the device include the grating pitch and height of 450 nm and 100 nm respectively, the silicon stripe width of 150 nm, and the oxide thickness of 200 nm. The fabricated device offered a spectral response suitable for a blue color filter, exhibiting the center wavelength of ~460 nm, the bandwidth ~90 nm and the peak transmission 40%. The positional dependence of its performance was examined to find the effective area of 3×3 mm2, where the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated to reveal that the rate of change in the relative transmission was equivalent to about 1.5%/degree.

Sang-Shin Lee

Papers

Color filter based on a subwavelength patterned metal grating

Aluminum plasmonics based highly transmissive polarization-independent subtractive color filters exploiting a nanopatch array

Silicon photonic temperature sensor employing a ring resonator manufactured using a standard CMOS process

Structural Color Filters Enabled by a Dielectric Metasurface Incorporating Hydrogenated Amorphous Silicon Nanodisks.

Color filter incorporating a subwavelength patterned grating in poly silicon.