Scott J. Limb

TL;DR: In this article, a method for forming a fluorocarbon polymer thin film on the surface of a structure is presented, in which a monomer gas, preferably hexafluoropropylene oxide, is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gases and produce reactive CF2 species in the vicinity of the structure surface.

TL;DR: In this article, X-ray photoelectron spectroscopy revealed that the films deposited from thermal decomposition of hexafluoropropylene oxide had fluorine to carbon ratios of 2.0 and CF2 fractions of 90% along with 10% of CF3 and CF moieties.

TL;DR: In this article, a method to coat thin wires with fluorocarbon material that is flexible and conformal has been achieved using pulsed plasma enhanced chemical vapor deposition (PECVD), which enables the chemical composition of the films to be tailored in order to achieve similar stoichiometry and chemical composition to bulk polytetrafluoroethylene [PTFE, (CF2)n, Teflon™].

TL;DR: In this article, pyrolytic chemical vapor deposition (pyrolyric CVD) of fluorocarbon films from hexafluoropropylene oxide (HFPO) has demonstrated the ability to molecularly design film architecture.

TL;DR: HWCVD affords the capability to synthesize fluorocarbon and organosilicon thin films as discussed by the authors, which are of interest for a wide range of applications, including low dielectric constant coatings for microelectronic interconnection, ‘dry’ photoresists, directly patternable dielectrics for lithographic production of integrated circuits, insulating biomaterials for implantable devices with complex topologies and small dimensions, low friction coatings, and semipermeable membranes.