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Shigeki Nakagawa

Researcher at Tokyo Institute of Technology

Publications -  244
Citations -  1326

Shigeki Nakagawa is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 16, co-authored 241 publications receiving 1256 citations.

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Perpendicular magnetic tunnel junction with tunneling magnetoresistance ratio of 64% using MgO (100) barrier layer prepared at room temperature

TL;DR: In this paper, a 3-nm-thick MgO tunneling barrier layer in p-MTJ multilayer prepared on glass substrate revealed (100) crystalline orientation.
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Highly (0 0 1) oriented FePt ordered alloy thin films fabricated from Pt(1 0 0)/Fe(1 0 0) structure on glass disks without seed layers

TL;DR: Sputter-deposited Fe thin films exhibited preferential orientation when they were deposited at a lower deposition rate below 0.6 ǫ A/s as discussed by the authors. But, the preferential orientation was not maintained for the (1 − 0 − 0)-oriented Fe layer.
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Preparation of Co ferrite thin films with large perpendicular and in-plane coercivities by facing targets sputtering

TL;DR: In this article, thin films with cobalt ferrite layer on ZnO underlayer were prepared at substrate temperature T/sub s/ in the range of 80 approximately 600 degrees C by a facing targets sputtering apparatus.
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Full-Heusler Co2FeSi alloy thin films with perpendicular magnetic anisotropy induced by MgO-interface

TL;DR: In this paper, the authors demonstrated that L21-ordered full-Heusler Co2FeSi (CFS) alloy film with thickness of 100 nm were formed by facing targets sputtering (FTS) method at a substrate temperature TS = 300 deg C.
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Full-Heusler Co2FeSi alloy thin films with perpendicular magnetic anisotropy induced by MgO-interfaces

TL;DR: In this article, a 100nm-thick L21-ordered full-Heusler Co2FeSi (CFS) alloy was fabricated using the FTS method at a substrate temperature TS of 300 °C.