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Simon Bubel

Researcher at Cree Inc.

Publications -  21
Citations -  292

Simon Bubel is an academic researcher from Cree Inc.. The author has contributed to research in topics: Thin-film transistor & Thin film. The author has an hindex of 10, co-authored 19 publications receiving 267 citations. Previous affiliations of Simon Bubel include University of California, Santa Barbara & University of Duisburg-Essen.

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Schmitt Trigger Using a Self‐Healing Ionic Liquid Gated Transistor

TL;DR: Electrical double layer transistors using ionic liquids as the gate and ZnO as the semiconductor exhibit stable operation in the presence of redox active additives and enable single components with the response of a Schmitt trigger.
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High performance low temperature solution-processed zinc oxide thin film transistor

TL;DR: Amorphous zinc oxide thin films have been processed out of an aqueous solution applying a one-step synthesis procedure as mentioned in this paper, making use of the higher solubility of ZnO⋅−×-H2O compared with the commonly used zinc oxide.
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The electrochemical impact on electrostatic modulation of the metal-insulator transition in nickelates

TL;DR: In this article, temperature/resistivity data suggest electrostatic modulation of the metal-insulator transition temperature of NdNiO3 in a wide regime, and additional voltammetric and x-ray photoelectron spectroscopy measurements demonstrate the electrochemical impact of the electrostatic doping approach with ionic liquids.
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Trap states and space charge limited current in dispersion processed zinc oxide thin films

TL;DR: In this article, the electric transport properties of nanoparticulate zinc oxide (ZnO) thin films are investigated in nitrogen and ambient atmosphere with respect to the effects of polymer adsorbates, in order to study the origin of hysteresis behavior of ZnO thin film transistors.
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Influence of stabilizers in ZnO nanodispersions on field-effect transistor device performance

TL;DR: In this article, the performance of field effect transistors is strongly affected by the nature and concentration of the stabilizer added to stabilize the nanodispersions, which can be explained by changes in the morphology, the particle-particle junction, and the passivation of surface defect sites.