S
Susumu Takeuchi
Publications - 2
Citations - 33
Susumu Takeuchi is an academic researcher. The author has contributed to research in topics: Gene & Photolithography. The author has an hindex of 1, co-authored 1 publications receiving 33 citations.
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Proceedings ArticleDOI
Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
John S. Petersen,Robert John Socha,Alex R. Naderi,Catherine A. Baker,Syed A. Rizvi,Douglas Van Den Broeke,Nishrin Kachwala,J. Fung Chen,Thomas Laidig,Kurt E. Wampler,Roger F. Caldwell,Susumu Takeuchi,Yoshiro Yamada,Takashi Senoh,Martin McCallum +14 more
TL;DR: In this article, the authors showed that a combination of 240 nm dual-trench and 5 nm to 10 nm undercut produces images with equal intensity between shifted and unshifted regions without loss of image contrasts.