T
T.-D. Lin
Publications - 1
Citations - 121
T.-D. Lin is an academic researcher. The author has contributed to research in topics: Gate dielectric & Chemical vapor deposition. The author has an hindex of 1, co-authored 1 publications receiving 116 citations.
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Interfacial self-cleaning in atomic layer deposition of HfO2 gate dielectric on In0.15Ga0.85As
TL;DR: An interfacial self-cleaning phenomenon was found in the atomic layer deposition of HfO2 on In0.15Ga0.85As∕GaAs substrate using Hf(NCH3C2H5)4, i.e., TEMAH, and H2O as the precursors as mentioned in this paper.