T
T. F. Deutsch
Publications - 2
Citations - 105
T. F. Deutsch is an academic researcher. The author has contributed to research in topics: Etching (microfabrication) & Resist. The author has an hindex of 2, co-authored 2 publications receiving 105 citations.
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Self‐developing resist with submicrometer resolution and processing stability
TL;DR: In this article, Nitrocellulose films have been shown to function as self-developing resist layers that are sensitive to both low energy ( 25:1) and high energy (2.5 µm) ion beam.
Journal ArticleDOI
Nitrocellulose as a self‐developing resist with submicrometer resolution and processing stability
TL;DR: In this paper, a self-developing resist layer was shown to develop at 0.6 μm/s−1 for a beam of 2 keV Ar+ ions (1 mA/cm−2).