The barrier discharge: basic properties and applications to surface treatment

https://link.springer.com/content/pdf/10.1016%2Fj.jasms.2007.07.027.pdf

Development of a dielectric barrier discharge ion source for ambient mass spectrometry

Mass spectrometry has recently undergone a second contemporary revolution with the introduction of a new group of desorption/ionization (DI) techniques known collectively as ambient mass spectrometry. Performed in an open atmosphere directly on samples in their natural environments or matrices, or by using auxiliary surfaces, ambient mass spectrometry (MS) has greatly simplified and increased the speed of MS analysis. Since its debut in 2004 there has been explosive growth in the applications and variants of ambient MS, and a very comprehensive set of techniques based on different desorption and ionization mechanisms is now available. Most types of molecules with a large range of masses and polarities can be ionized with great ease and simplicity with the outstanding combination of the speed, selectivity, and sensitivity of MS detection. This review describes and compares the basis of ionization and the concepts of the most promising ambient MS techniques known to date and illustrates, via typical analytical and bioanalytical applications, how ambient MS is helping to bring MS analysis deeper than ever into the “real world” open atmosphere environment—to wherever MS is needed.

Ambient mass spectrometry: bringing MS into the “real world”

Mass spectrometric ionization methods that operate under ambient conditions and require minimal or no sample pretreatment have attracted much attention in such fields as biomedicine, food safety, antiterrorism, pharmaceuticals, and environmental pollution. These technologies usually involve separate ionization and sample-introduction events, allowing independent control over each set of conditions. Ionization is typically performed under ambient conditions through use of existing electrospray ionization (ESI) or atmospheric pressure chemical ionization (APCI) techniques. Rapid analyses of gas, liquid, and solid samples are possible with the adoption of various sample-introduction methods. This review sorts different ambient ionization techniques into two main subcategories, primarily on the basis of the ionization processes, that are further differentiated in terms of the approach used for sampling.

Ambient Ionization Mass Spectrometry

Over the last ten years, expansion of atmospheric pressure plasma solutions for surface treatment of materials has been remarkable, however direct plasma technology for thin film deposition needs still great effort. The objective of this paper is to establish the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) a viable option for industrial application. Basic scientific principles to understand and optimize an AP-PECVD process are summarized. Laboratory reactor configurations are reviewed. Reference points for the design and use of AP-PECVD reactors according to the desired thin film properties are given. Finally, solutions to avoid powder formation and to increase the thin film growth rate are discussed.

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Dielectric barrier discharges (DBD) at atmospheric pressure are presented as a tool to create organosilicon deposits on technical planar aluminium substrates (up to 15 × 8 cm2) by admixing small amounts of hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) to the carrier gas of the discharges. Using barrier materials of different specific capacities (2.6 × 104 and 3.2 pF/cm2) in two electrode arrangements operated at less than 1 W, the influence of the filament properties on the deposition is studied. In comparison to these arrangements, a third electrode setup with a barrier of the specific capacity of 2.9 pF/cm2 is operated at approximately 50 W to study the influence of the specific energy of the plasma (energy per molecule) on the deposition process. The plasma chemical process was studied qualitatively by Gas Chromatography, and properties of the plasma-treated substrates were examined by means of X-ray Photoelectron Spectroscopy (XPS), Fourier Transform Infrared (FTIR) spectroscopy, as well as visually.

T. M. Tun

Papers

Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison