T
Taejun Lee
Researcher at Pohang University of Science and Technology
Publications - 12
Citations - 529
Taejun Lee is an academic researcher from Pohang University of Science and Technology. The author has contributed to research in topics: Scattering & Diffraction. The author has an hindex of 6, co-authored 11 publications receiving 191 citations.
Papers
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Journal ArticleDOI
Plasmonic- and dielectric-based structural coloring: from fundamentals to practical applications.
TL;DR: A scale-up of fabrication methods, including nanoimprinting, self-assembly and laser-induced process that may enable real-world application of structural coloring are highlighted.
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Spectral Modulation through the Hybridization of Mie-Scatterers and Quasi-Guided Mode Resonances: Realizing Full and Gradients of Structural Color
TL;DR: This work identifies and characterize the mechanisms behind each and provides a framework that can be used to design any all-dielectric metasurfaces of subwavelength Mie scatterers for spectral modulation.
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Giant chiro-optical responses in multipolar-resonances-based single-layer dielectric metasurfaces
Hafiz Saad Khaliq,Inki Kim,Aima Zahid,Joohoon Kim,Taejun Lee,Trevon Badloe,Yeseul Kim,Muhammad Zubair,Kashif Riaz,Muhammad Qasim Mehmood,Junsuk Rho +10 more
TL;DR: In this paper, an all-dielectric metasurface is proposed to realize large chiro-optical effects in the visible regime, where the mutual coupling between carefully engineered nanofins produces constructive and destructive interference, leading to asymmetric transmission of 70% and average circular dichroism exceeding 60%.
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Near-zero reflection of all-dielectric structural coloration enabling polarization-sensitive optical encryption with enhanced switchability
C. U. Jung,Younghwan Yang,Jaehyuck Jang,Trevon Badloe,Taejun Lee,Jungho Mun,Seong-Won Moon,Junsuk Rho +7 more
TL;DR: In this article, a completely on/off switchable structural coloration with polarization-sensitive metasurfaces is proposed, enabling full-colored images to be displayed and hidden through the control of the polarization of incident light.
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Nanoimprint lithography for high-throughput fabrication of metasurfaces
TL;DR: In this article, a review of various nano-imprint lithography (NIL) technologies for the manufacturing of active metasurfaces is presented, where the authors briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of active surfaces.