T
Takamasa Kosai
Publications - 2
Citations - 134
Takamasa Kosai is an academic researcher. The author has contributed to research in topics: Crystallization & Crystal growth. The author has an hindex of 2, co-authored 2 publications receiving 134 citations.
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Patent
Method for fabricating a semiconductor device using a catalyst introduction region
Naoki Makita,Funai Takashi,Yoshitaka Yamamoto,Yasuhiro Mitani,Katsumi Nomura,Tadayoshi Miyamoto,Takamasa Kosai +6 more
TL;DR: In this article, a high-quality crystalline silicon film, having the crystal growth direction aligned in one direction and having no grain boundaries, is obtained using the newly introduced catalyst elements efficiently diffuse only inside the island-patterned amorphous silicon films.
Patent
Semiconductor device formed within asymetrically-shaped seed crystal region
Naoki Makita,Funai Takashi,Yoshitaka Yamamoto,Yasuhiro Mitani,Katsumi Nomura,Tadayoshi Miyamoto,Takamasa Kosai +6 more
TL;DR: In this article, a high-quality crystalline silicon film, having the crystal growth direction aligned in one direction and having no grain boundaries, is obtained using the newly introduced catalyst elements efficiently diffuse only inside the island-patterned amorphous silicon films.