T
Takashi Kawakubo
Researcher at Toshiba
Publications - 174
Citations - 2957
Takashi Kawakubo is an academic researcher from Toshiba. The author has contributed to research in topics: Electrode & Thin film. The author has an hindex of 30, co-authored 174 publications receiving 2925 citations.
Papers
More filters
Journal ArticleDOI
Thickness Dependence of Ferroelectricity in Heteroepitaxial BaTiO3 Thin Film Capacitors
TL;DR: In this article, a two-step deposition of BaTiO3 films with various thicknesses ranging from 12 nm to 79 nm was performed on SrRuO3/SrTiO 3 substrates by radio-frequency magnetron sputtering.
Journal ArticleDOI
Static and Cyclic Fatigue Behavior of a Sintered Silicon Nitride at Room Temperature
TL;DR: In this article, the static and cyclic fatigue behavior of sintered silicon nitride was investigated at room temperature, and it was shown that the minimum time to failure was almost the same, in spite of differences in loading mode or frequency.
Journal ArticleDOI
Asymmetric Ferroelectricity and Anomalous Current Conduction in Heteroepitaxial BaTiO3 Thin Films
TL;DR: In this article, asymmetric ferroelectricity and conduction of anomalous leakage current were observed in heteroepitaxial BaTiO3 thin films grown by rf magnetron sputtering at 600° C on three different electrode/substrate combinations: SrRuO3/SrTiO 3, Pt/MgO and Nb doped Sr TiO3.
Patent
Piezoelectric thin film device and method for manufacturing the same
Kenya Sano,Ryoichi Ohara,Naoko Yanase,Takaaki Yasumoto,Kazuhiko Itaya,Takashi Kawakubo,Hiroshi Toyoda,Masahiko Hasunuma,Toshihiko Nagano,Kazuhide Abe,Michihiko Nishigaki,Hironobu Shibata +11 more
TL;DR: In this article, a piezoelectric thin-film device is described, where one of the crystal axis of the thin film is aligned in a direction perpendicular to a surface of the amorphous metal.
Journal ArticleDOI
Corrosion Behavior of Silicon Carbide in 290°C Water
TL;DR: In this paper, the fundamental corrosion behavior of silicon carbide (SiC) ceramics was investigated after immersion in 290°C water solutions with different pH and dissolved-oxygen concentrations.