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Takeshi Miki

Researcher at National Institute of Advanced Industrial Science and Technology

Publications -  151
Citations -  1647

Takeshi Miki is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Thin film & Dielectric. The author has an hindex of 18, co-authored 147 publications receiving 1514 citations. Previous affiliations of Takeshi Miki include Sony Broadcast & Professional Research Laboratories & Tokyo Institute of Technology.

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Enhanced oxygen storage capacity of cerium oxides in cerium dioxide/lanthanum sesquioxide/alumina containing precious metals

TL;DR: In this paper, the effects of the addition of precious metals (PM; Pt, Rh) on CeOsub 2/Al{sub 2}O{sub 3} catalysts were confirmed to enhance the oxygen storage capacities.
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Nickel Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering

TL;DR: In this paper, a sample with low oxygen flow rate, high power and substrate temperature of 200-300° C showed a wide transmittance modulation range, and the deposition rate was as high as 30 nm/min.
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Dielectric and piezoelectric properties of highly (1 0 0)-oriented BaTiO3 thin film grown on a Pt/TiOx/SiO2/Si substrate using LaNiO3 as a buffer layer

TL;DR: In this article, BaTiO 3 thin films were deposited onto a Pt/TiO x /SiO 2 /Si substrate via the chemical solution deposition method, with LaNiO 3 as a buffer layer.
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Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering

TL;DR: In this paper, the physical properties of Niobium oxide electrochromic thin films were studied by reactive d.c. magnetron sputtering, and their physical properties, such as surface structure, composition, optical transmittance, reflectance and absorption, were studied.
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Ferroelectric properties of alkoxy-derived CaBi4Ti4O15 thin films on Pt-passivated Si

TL;DR: In this paper, a spin coating of a precursor solution of metal alkoxides was used to spin-coated CaBi4Ti4O15 (CBTi144) thin films, which reached full crystallinity of a single phase of layered perovskite at 650°C via rapid thermal annealing in oxygen.