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Kazuki Yoshimura

Researcher at National Institute of Advanced Industrial Science and Technology

Publications -  134
Citations -  2527

Kazuki Yoshimura is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Thin film & Layer (electronics). The author has an hindex of 24, co-authored 133 publications receiving 2328 citations. Previous affiliations of Kazuki Yoshimura include Industrial Research Institute.

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Wavelength tuning of surface plasmon resonance using dielectric layers on silver island films

TL;DR: In this article, a simple and effective method was demonstrated to tune surface plasmon resonance (SPR) wavelength of silver island films by introducing a dielectric medium to vary interisland dielectrics constant, either overcoating or sandwiching the silver islands can make a dramatic effect on the tunability.
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Optimization of antireflection coating for VO2-based energy efficient window

TL;DR: In this article, an antireflection (AR) coating for the VO 2 -based window was proposed, which achieved an improvement in the maximum integrated luminous transmittance (T lum) from 32% to 55% for 50-nm VO 2 films.
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Nickel Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering

TL;DR: In this paper, a sample with low oxygen flow rate, high power and substrate temperature of 200-300° C showed a wide transmittance modulation range, and the deposition rate was as high as 30 nm/min.
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Thickness dependence of optical properties of VO2 thin films epitaxially grown on sapphire (0001)

TL;DR: In this article, the effects of film thickness ranging from 3 to 150nm on optical properties were investigated and it revealed that the semiconductor-metal phase transition temperature considerably decreases as film thickness decreases, in particular for the film with thickness less than 10nm.
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A VO2-Based multifunctional window with highly improved luminous transmittance

TL;DR: In this article, a novel window structure composed of VO2 thermochromic film with TiO2 antireflection (AR) coating was proposed, which predicts a strong enhancement in luminous transmittance (Tlum).