scispace - formally typeset
T

Thomas Schwarz-Selinger

Researcher at Max Planck Society

Publications -  200
Citations -  4075

Thomas Schwarz-Selinger is an academic researcher from Max Planck Society. The author has contributed to research in topics: Tungsten & Deuterium. The author has an hindex of 33, co-authored 186 publications receiving 3452 citations.

Papers
More filters
Journal ArticleDOI

Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

TL;DR: In this paper, a strong correlation was found between the hydrogen content of the films and the film properties, which was explained by the random-covalent network model, which is in contrast to a widely accepted study where no dependence of film properties on the source gas was observed, this being ascribed to a lost-memory effect.
Journal ArticleDOI

Quantification of the deuterium ion fluxes from a plasma source

TL;DR: In this paper, an electron-cyclotron-resonance plasma source with a biased sample holder was presented for the implantation of deuterium ions into tungsten, achieving achievable energies range from several electronvolts up to 200 eV per deuteron.
Journal ArticleDOI

Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: Consequences for the formation of re-deposited layers in fusion experiments

TL;DR: The success of present-day fusion experiments relies on the use of a divertor which efficiently pumps impurities generated by erosion of the first wall as discussed by the authors, which is crucial for the performance of a next-step device, since the total lifetime before replacement strongly depends on the ability to control this re-deposition.
Journal ArticleDOI

Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces

TL;DR: In this article, the surface loss probability of hydrocarbon radicals on the surface of amorphous hydrogenated carbon (C:H) films is investigated by depositing films inside a cavity with walls made from silicon substrates.
Journal ArticleDOI

Micron-scale modifications of Si surface morphology by pulsed-laser texturing

TL;DR: In this article, the morphologies of Si surfaces are modified with single, tightly focused nanosecond laser pulses and characterized by atomic force microscopy (AFM) and quantitative comparison of theory and experiment is enabled by first removing the native oxide of Si with dilute HF acid.