T
Toshihiko Maemoto
Researcher at Osaka Institute of Technology
Publications - 53
Citations - 206
Toshihiko Maemoto is an academic researcher from Osaka Institute of Technology. The author has contributed to research in topics: Thin film & Thin-film transistor. The author has an hindex of 8, co-authored 51 publications receiving 196 citations.
Papers
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Journal ArticleDOI
Zinc oxide ion-sensitive field-effect transistors and biosensors
Mitsuaki Yano,Kazuto Koike,Kazuya Mukai,Takayuki Onaka,Yuichi Hirofuji,Ken-ichi Ogata,Sigeru Omatu,Toshihiko Maemoto,Shigehiko Sasa +8 more
TL;DR: In this paper, the characteristics of polycrystalline ZnO-based ion-sensitive field effect transistors (ISFETs) and FET-type biosensors are studied.
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Growth of ZnO/Zn1−xMgxO films by pulsed laser ablation
TL;DR: In this paper, a multilayer ZnO/Zn 0.9 Mg 0.1 O multi-layer films were grown by stacking alternate layers of Zn and ZnMgO with equal thickness varying from 2 to 8 nm.
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Pulsed laser deposition of ZnO grown on glass substrates for realizing high-performance thin-film transistors
TL;DR: In this article, the authors reported the characterization of ZnO thin-film transistors (TFTs) on glass substrates fabricated by pulsed laser deposition (PLD).
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Rectification Effects of ZnO-Based Transparent Nanodiodes on Glass and Flexible Plastic Substrates
TL;DR: In this article, self-switching nanodiodes (SSDs) using zinc oxide (ZnO) were fabricated on glass substrates and the changes in characteristics depending on the shape of SSDs were investigated.
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Intense Terahertz Radiation from InAs Thin Films
Shigehiko Sasa,Shinya Umino,Yutaro Ishibashi,Toshihiko Maemoto,Masataka Inoue,Kei Takeya,Masayoshi Tonouchi +6 more
TL;DR: In this paper, the authors measured the THz radiation intensity from InAs thin films with thickness between 100nm and 1.5μm excited by a femtosecond laser pulse with a wavelength of approximately 780nm.