V
V. N. Jmerik
Researcher at Ioffe Institute
Publications - 140
Citations - 1488
V. N. Jmerik is an academic researcher from Ioffe Institute. The author has contributed to research in topics: Molecular beam epitaxy & Quantum well. The author has an hindex of 19, co-authored 134 publications receiving 1318 citations. Previous affiliations of V. N. Jmerik include Russian Academy of Sciences.
Papers
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Journal ArticleDOI
Mie Resonances, Infrared Emission, and the Band Gap of InN
T. V. Shubina,Stefan Ivanov,V. N. Jmerik,Dmitry Solnyshkov,V. A. Vekshin,P. S. Kop’ev,A M Vasson,Joël Leymarie,Alexey Kavokin,Hiroshi Amano,K. Shimono,A. Kasic,Bo Monemar +12 more
TL;DR: It is shown by direct thermally detected optical absorption measurements that the true band gap of InN is markedly wider than the currently accepted 0.7 eV.
Journal ArticleDOI
High-Output-Power Ultraviolet Light Source from Quasi-2D GaN Quantum Structure
Xin Rong,Xinqiang Wang,Stefan Ivanov,Xin-he Jiang,Guang Chen,Ping Wang,Weiying Wang,He Chenguang,Tao Wang,Tobias Schulz,Martin Albrecht,V. N. Jmerik,Alexey A. Toropov,Viacheslav V. Ratnikov,Vladimir I. Kozlovsky,Vladimir I. Kozlovsky,V. P. Martovitsky,Peng Jin,Xu Fujun,Xuelin Yang,Zhixin Qin,Weikun Ge,Jun-jie Shi,Bo Shen +23 more
TL;DR: Quasi-2D GaN layers inserted in an AlGaN matrix are proposed as a novel active region to develop a high-output-power UV light source and shows an amazing output power of ≈160 mW at 285 nm with a pulsed electron-beam excitation.
Journal ArticleDOI
Low-threshold 303 nm lasing in AlGaN-based multiple-quantum well structures with an asymmetric waveguide grown by plasma-assisted molecular beam epitaxy on c-sapphire
V. N. Jmerik,A. M. Mizerov,A. A. Sitnikova,P. S. Kop’ev,Stefan Ivanov,Evgenii V. Lutsenko,N. P. Tarasuk,N. V. Rzheutskii,G. P. Yablonskii +8 more
TL;DR: In this paper, an AlGaN multiple-quantum-well separate confinement laser heterostructures were constructed by plasma-assisted molecular-beam epitaxy directly on c-sapphire at low temperatures.
Journal ArticleDOI
Plasma‐assisted molecular beam epitaxy of AlGaN heterostructures for deep‐ultraviolet optically pumped lasers
TL;DR: In this paper, the growth conditions of AlN nucleation layers with suppressed generation of threading dislocations (TDs), 2-µm thick AlN buffer layers with atomically smooth droplet-free morphology, cladding and waveguide AlGaN layers also possessing the accurate established phase diagram of metal(Ga)-rich growth conditions within the temperature range 660-780 °C.
Journal ArticleDOI
Plasma-assisted MBE growth and characterization of InN on sapphire
TL;DR: In this paper, the growth conditions of InN/Al2O3 (0 0 0 0 1) epilayers grown by plasma-assisted molecular beam epitaxy (MBE), their optical properties in the IR range, and the In clustering in the layers were investigated.