V
van de Mj Marco Sande
Researcher at Eindhoven University of Technology
Publications - 10
Citations - 239
van de Mj Marco Sande is an academic researcher from Eindhoven University of Technology. The author has contributed to research in topics: Plasma & Thomson scattering. The author has an hindex of 8, co-authored 10 publications receiving 229 citations.
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Thomson scattering on a low-pressure, inductively-coupled gas discharge lamp
TL;DR: In this paper, an experimental system for laser Thomson scattering on a low-pressure, inductively-coupled gas discharge lamp and measurements of ne and Te in this lamp are presented.
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Single-shot Thomson scattering on argon plasmas created by the Microwave Plasma Torch; evidence for a new plasma class
van der Jjam Joost Mullen,van der Jjam Joost Mullen,van de Mj Marco Sande,de N Nienke Vries,Bhp Bart Broks,EI Ekaterina Iordanova,EI Ekaterina Iordanova,Antonio Gamero,J Torres,Antonio Sola +9 more
TL;DR: In this article, the authors used single-shot Thomson scattering (TS) measurements to determine the fine-structure size of plasmas created by a Microwave Plasma Torch (MPT) to find a solution for the long-standing discrepancy between experiments and Global Plasma Models.
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Plasma characterization of an atmospheric microwave plasma torch using diode laser absorption studies of the argon 4s 3P2 state
TL;DR: In this paper, the authors performed laser absorption experiments on atmospheric microwave induced argon plasmas produced by the 'Torche a Injection Axiale' in order to study the 4s 3P2 metastable densities and deduce plasma properties.
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Time resolved electron density and temperature measurements on a capacitively coupled helium RF discharge
TL;DR: In this article, the electron gas parameters of a small capacitively coupled RF plasma source with helium were measured with temporal resolution using a triple-grating spectrograph for stray light rejection and by absolute spectral line intensity measurements.
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The relation between internal and external parameters of a spectrochemical inductively coupled plasma
TL;DR: In this article, the internal plasma parameters are related directly to the external operational parameters of the plasma, such as the plasma dimensions, power density, and pressure, and can be used to estimate the internal parameters and predict trends for a change in the operational parameters.