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Viktor A. Podolskiy

Researcher at University of Massachusetts Lowell

Publications -  255
Citations -  10579

Viktor A. Podolskiy is an academic researcher from University of Massachusetts Lowell. The author has contributed to research in topics: Metamaterial & Plasmon. The author has an hindex of 48, co-authored 249 publications receiving 9912 citations. Previous affiliations of Viktor A. Podolskiy include Oregon State University & University of Massachusetts Amherst.

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Proceedings ArticleDOI

Angle-independent Salisbury screens based on nonlocal nanowire metamaterials

TL;DR: In this article, nonlocal nanowire metamaterials can help to alleviate one of the main limitations of Salisbury screens, their dependence on the incident angle, and they demonstrate that non-local nano-materials can improve the performance of the Salisbury screen.
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Imaging properties of anisotropy-based negative index composites

TL;DR: In this article, a detailed study of optical properties of nonmagnetic, nonperiodic planar materials with negative refractive index was presented, and the possibility of achieving far-field resolution below the free-space diffraction limit in these systems was demonstrated.
Proceedings ArticleDOI

Non-magnetic System with Negative Index of Refraction for Terahertz Application

TL;DR: In this paper, a non-magnetic system with negative refraction index for terahertz applications is proposed based on a planar metallic waveguide with bismuth core.
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Evolution of beaming pattern in corrugated mid-IR plasmonic structures

TL;DR: In this paper, the formation of highly directional beams from a subwavelength aperture surrounded by surface corrugations through a high-index superstrate was considered and it was shown that the beaming pattern strongly depends on the distance to the aperture.
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Modeling asymmetric reflectance in semicontinuous metal films using generalized Ohm's Law

TL;DR: In this paper, generalized Ohm's Law is used to model the phenomenon of broadband asymmetric reflectance observed in semicontinuous metal-dielectric films in the proximity of the percolation threshold.