Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented attention due to their wide-ranging applications encompassing green, blue, violet, and ultraviolet (UV) emitters and detectors (in photon ranges inaccessible by other semiconductors) and high-power amplifiers. However, even the best of the three binaries, GaN, contains many structural and point defects caused to a large extent by lattice and stacking mismatch with substrates. These defects notably affect the electrical and optical properties of the host material and can seriously degrade the performance and reliability of devices made based on these nitride semiconductors. Even though GaN broke the long-standing paradigm that high density of dislocations precludes acceptable device performance, point defects have taken the center stage as they exacerbate efforts to increase the efficiency of emitters, increase laser operation lifetime, and lead to anomalies in electronic devices. The p...

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Luminescence properties of defects in GaN

Industries such as the automotive, aerospace or military, as well as environmental and biological research have promoted the development of ultraviolet (UV) photodetectors capable of operating at high temperatures and in hostile environments. UV-enhanced Si photodiodes are hence giving way to a new generation of UV detectors fabricated from wide-bandgap semiconductors, such as SiC, diamond, III-nitrides, ZnS, ZnO, or ZnSe. This paper provides a general review of latest progresses in wide-bandgap semiconductor photodetectors.

https://iopscience.iop.org/article/10.1088/0268-1242/18/4/201/pdf

Wide-bandgap semiconductor ultraviolet photodetectors

Thermally induced growth of graphene on the two polar surfaces of $6H\text{\ensuremath{-}}\mathrm{Si}\mathrm{C}$ is investigated with emphasis on the initial stages of growth and interface structure. The experimental methods employed are angle-resolved valence band photoelectron spectroscopy, soft x-ray induced core-level spectroscopy, and low-energy electron diffraction. On the Si-terminated (0001) surface, the $(6\sqrt{3}\ifmmode\times\else\texttimes\fi{}6\sqrt{3})R30\ifmmode^\circ\else\textdegree\fi{}$ reconstruction is the precursor of the growth of graphene and it persists at the interface upon the growth of few layer graphene (FLG). The $(6\sqrt{3}\ifmmode\times\else\texttimes\fi{}6\sqrt{3})R30\ifmmode^\circ\else\textdegree\fi{}$ structure is a carbon layer with graphene-like atomic arrangement covalently bonded to the substrate where it is responsible for the azimuthal ordering of FLG on SiC(0001). In contrast, the interaction between graphene and the C-terminated $(000\overline{1})$ surface is much weaker, which accounts for the low degree of order of FLG on this surface. A model for the growth of FLG on SiC{0001} is developed, wherein each new graphene layer is formed at the bottom of the existing stack rather than on its top. This model yields, in conjunction with the differences in the interfacial bonding strength, a natural explanation for the different degrees of azimuthal order observed for FLG on the two surfaces.

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Interaction, growth, and ordering of epitaxial graphene on SiC{0001} surfaces: A comparative photoelectron spectroscopy study

Ultraviolet (UV) photodetectors have drawn extensive attention owing to their applications in industrial, environmental and even biological fields. Compared to UV-enhanced Si photodetectors, a new generation of wide bandgap semiconductors, such as (Al, In) GaN, diamond, and SiC, have the advantages of high responsivity, high thermal stability, robust radiation hardness and high response speed. On the other hand, one-dimensional (1D) nanostructure semiconductors with a wide bandgap, such as β-Ga2O3, GaN, ZnO, or other metal-oxide nanostructures, also show their potential for high-efficiency UV photodetection. In some cases such as flame detection, high-temperature thermally stable detectors with high performance are required. This article provides a comprehensive review on the state-of-the-art research activities in the UV photodetection field, including not only semiconductor thin films, but also 1D nanostructured materials, which are attracting more and more attention in the detection field. A special focus is given on the thermal stability of the developed devices, which is one of the key characteristics for the real applications.

A Comprehensive Review of Semiconductor Ultraviolet Photodetectors: From Thin Film to One-Dimensional Nanostructures

III-V semiconductors have high mobility and will be used in field effect transistors with the appropriate gate dielectric. The dielectrics must have band offsets over 1eV to inhibit leakage. The band offsets of various gate dielectrics including HfO2, Al2O3, Gd2O3, Si3N4, and SiO2 on III-V semiconductors such as GaAs, InAs, GaSb, and GaN have been calculated using the method of charge neutrality levels. Generally, the conduction band offsets are found to be over 1eV, so they should inhibit leakage for these dielectrics. On the other hand, SrTiO3 has minimal conduction band offset. The valence band offsets are also reasonably large, except for Si nitride on GaN and Sc2O3 on GaN which are 0.6–0.8eV. There is reasonable agreement with experiment where it exists, although the GaAs:SrTiO3 case is even worse in experiment.

https://www.researchgate.net/file.PostFileLoader.html?id=53ba3e1fd2fd64bc5d8b4653&assetKey=AS%3A273553407053824%401442231622645

Band offsets of high K gate oxides on III-V semiconductors

The electronic properties and the electron affinities of AlxGa1−xN(0001) surfaces were investigated by ultraviolet photoemission spectroscopy (UPS) over the whole composition range. The samples were prepared by N-ion sputtering and annealing. Surface cleanliness and stoichiometry were monitored with x-ray photoemission spectroscopy. Samples with high aluminum content showed traces of oxygen which could not be removed by further cleaning cycles. However, we have evidence that the oxygen is located in the bulk and not at the surface. From the UP spectra the ionization energies and electron affinities as a function of composition x were determined. A decrease in electron affinity with increasing aluminum content was found, but the electron affinity remains positive for all x. Thus, earlier predictions of negative electron affinity for high aluminum content were not confirmed.

Electron affinity of AlxGa1−xN(0001) surfaces

Phonons in 3C-, 4H-, and 6H-SiC

Surface analysis of 6HSiC

The continua of interface-induced gap states (IFIGS) determine the band-structure lineup at semiconductor interfaces. Hence, both barrier heights of Schottky contacts and valence-band offsets in semiconductor heterostructures are composed of a zero-charge-transfer and an electric-dipole term. The analysis of experimental barrier heights and valence-band offsets yields IFIGS branch-point energies of 3.51±0.07eV for SiO2 and 2.98±0.26eV, 2.27±0.14, and 2.87±0.14eV for the high-κ oxides Al2O3, HfO2, and ZrO2, respectively. In the oxide heterostructures, the electric-dipole terms come up to 30% of the valence-band offsets and can thus not be neglected.

W. Mönch

Papers

Electron affinity of AlxGa1−xN(0001) surfaces

Phonons in 3C-, 4H-, and 6H-SiC

Surface analysis of 6HSiC

On the electric-dipole contribution to the valence-band offsets in semiconductor-oxide heterostructures

Oxidation stages of clean and H-terminated Si(001) surfaces at room temperature