W
William W Gerberich
Researcher at University of Minnesota
Publications - 414
Citations - 12745
William W Gerberich is an academic researcher from University of Minnesota. The author has contributed to research in topics: Nanoindentation & Dislocation. The author has an hindex of 59, co-authored 414 publications receiving 12119 citations.
Papers
More filters
Journal ArticleDOI
Interfacial toughness measurements for thin films on substrates
TL;DR: There are more than 200 different methods for measuring thin film adhesion, suggesting it to be material, geometry and even industry specific as discussed by the authors, suggesting that the major extrinsic variables are film stress, extent of delamination, thickness and temperature while the major intrinsic ones are modulus, yield strength, the thermodynamic work of adhesion and one or more length scales.
Journal ArticleDOI
Indentation induced dislocation nucleation: The initial yield point
TL;DR: In this article, a model based upon discretized dislocations is proposed for both the initiation of yielding at an upper yield point and the arrest of the indenter at a lower yield point.
Journal ArticleDOI
Non-linear deformation mechanisms during nanoindentation
TL;DR: In this article, a superdislocation model was proposed to predict the yield point during indentation of tungsten and an iron alloy using the change in shear stress between the elastically and fully plastic loading conditions.
Journal ArticleDOI
Anomalous plastic deformation at surfaces: Nanoindentation of gold single crystals
TL;DR: In this article, the authors show that a series of discrete yielding events separated by elastic deformation can be observed in single-crystal Au(111, Au(110, and Au(100), and that the onset of this behavior is in agreement with calculations for the theoretical shear strength of gold.
Journal ArticleDOI
Fracture toughness, adhesion and mechanical properties of low-K dielectric thin films measured by nanoindentation
TL;DR: A cube corner indentation method was used to measure the fracture toughness of organo-silicate glass (OSG) films, which ranges from 0.01 to 0.05 MPaOm.