W
Wolfgang Kowalsky
Researcher at Braunschweig University of Technology
Publications - 291
Citations - 11636
Wolfgang Kowalsky is an academic researcher from Braunschweig University of Technology. The author has contributed to research in topics: OLED & Laser. The author has an hindex of 53, co-authored 281 publications receiving 10631 citations. Previous affiliations of Wolfgang Kowalsky include Heidelberg University & Princeton University.
Papers
More filters
Journal ArticleDOI
Transition Metal Oxides for Organic Electronics: Energetics, Device Physics and Applications
TL;DR: An overview of TMO-based device architectures ranging from transparent OLEDs to tandem OPV cells is given, and various TMO film deposition methods are reviewed, addressing vacuum evaporation and recent approaches for solution-based processing.
Journal ArticleDOI
Role of the deep-lying electronic states of MoO3 in the enhancement of hole-injection in organic thin films
TL;DR: In this paper, the electron affinity and ionization energy of vacuum-deposited molybdenum trioxide (MoO3) and of a typical MoO3/hole transport material (HTM) interface were determined via ultraviolet and inverse photoelectron spectroscopy.
Journal ArticleDOI
P-type doping of organic wide band gap materials by transition metal oxides: A case-study on Molybdenum trioxide
TL;DR: In this article, a study on p-doping of organic wide band gap materials with Molybdenum trioxide using current transport measurements, ultraviolet photo-electron spectroscopy and inverse photo electrophoresis was presented.
Journal ArticleDOI
Towards See-Through Displays: Fully Transparent Thin-Film Transistors Driving Transparent Organic Light-Emitting Diodes**
Patrick Görrn,Michelle Y. Sander,Jens Meyer,Michael Kröger,Eike Becker,Hans-Hermann Johannes,Wolfgang Kowalsky,Thomas Riedl +7 more
TL;DR: In this paper, the authors demonstrate that this vision is on the verge of becoming reality by using transparent thin-film transistors (TTFTs) as pixel drivers for fully transparent displays.
Journal ArticleDOI
Al2O3/ZrO2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers—A Strategy for Reliable Encapsulation of Organic Electronics
Jens Meyer,Patrick Görrn,Franz Bertram,Sami Hamwi,Thomas Winkler,Hans-Hermann Johannes,Thomas Weimann,Peter Hinze,Thomas Riedl,Wolfgang Kowalsky +9 more
TL;DR: In this article, the authors report on thin encapsulation layers prepared by ALD at a temperature of 80 8C, and introduce novel highly efficient permeation barriers based on so-called nanolaminate structures.