scispace - formally typeset
W

Wu Zi-Qin

Researcher at University of Science and Technology of China

Publications -  75
Citations -  541

Wu Zi-Qin is an academic researcher from University of Science and Technology of China. The author has contributed to research in topics: Crystallization & Thin film. The author has an hindex of 11, co-authored 75 publications receiving 531 citations.

Papers
More filters
Journal ArticleDOI

Random successive growth model for pattern formation

TL;DR: A random successive growth model where no long-range diffusion is necessary has been proposed and fractal, dense-branching, and compact growth patterns have been obtained.
Journal ArticleDOI

Temperature dependence of fractal formation in ion-implanted a-Ge/Au bilayer thin films

Hou Jian-Guo, +1 more
- 15 Jul 1989 - 
TL;DR: Etude des regions fractales apparaissant dans des couches doubles implantees and recuites is described in this paper, where les dimensions fractales and la densite fractale (nombre de fractales par unite d'aire) dependent de la temperature
Journal ArticleDOI

A comparison of Monte Carlo simulations of electron scattering and X-ray production in solids

Ding Zejun, +1 more
- 14 Apr 1993 - 
TL;DR: In this paper, Monte Carlo simulations of electron scattering in silver have been performed at 6 and 20 keV to investigate the relation between electron transport, backscattering and depth distribution of characteristic X-ray production of tracer elements.
Journal ArticleDOI

Experimental demonstration of the role of local latent heat in Ge pattern formation.

TL;DR: In this article, the pattern formation of morphous geometrical bilayer thin films with different Au grain size was investigated, and the pattern geometry is governed by the latent-temperature field range and the lattice network formed by the grain boundaries of the underlying Au film.
Journal ArticleDOI

Multifractal behavior of solid-on-solid growth

TL;DR: In this article, the authors studied the multifractal behavior of solid-on-solid growth on a 2D substrate, and they showed that the deposition process can be characterized by a multi-fractal approach and the widths Δα and the heights Δf of singularity spectra f(α) are re;ated to the average film thickness h (proportional to the deposition time) as Δα ∼ hγ1 and Δf ∼ δγ2, where γ1 = −0.92±0.03 and γ2