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Yijie Huo
Researcher at Stanford University
Publications - 107
Citations - 2979
Yijie Huo is an academic researcher from Stanford University. The author has contributed to research in topics: Solar cell & Thin film. The author has an hindex of 25, co-authored 107 publications receiving 2575 citations.
Papers
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Proceedings ArticleDOI
Low Power SiGe Electroabsorption Modulators for Optical Interconnects
Edward T. Fei,Elizabeth H. Edwards,Yijie Huo,Xiaochi Chen,Stephanie A. Claussen,Xi Liu,Yiwen Rong,Theodore I. Kamins,David Miller,James S. Harris +9 more
TL;DR: In this paper, the authors demonstrate low voltage quantum-confined Stark effect electroabsorption in a Ge/SiGe quantum well diode with a new thin intrinsic layer design, showing the potential for absorptive modulators with low photocurrent dissipation power.
Journal ArticleDOI
Improving characterization capabilities in new single-photon avalanche diode research.
Xun Ding,Kai Zang,Tianzhe Zheng,Yueyang Fei,Ming-Qi Huang,Xiang Liu,Yue-Fei Wang,Ge Jin,Yijie Huo,James S. Harris,Xiao Jiang +10 more
TL;DR: A high-speed digital storage oscilloscope (DSO) is used to extract the weak avalanche signals from the large gating response background by waveform subtraction in software, which makes this method very useful in new SPAD research.
Proceedings ArticleDOI
Light emission in Ge quantum wells
Edward T. Fei,Yijie Huo,Gary Shambat,Xiaochi Chen,Xi Liu,Stephanie A. Claussen,Elizabeth H. Edwards,Theodore I. Kamins,David A. B. Miller,Jelena Vuckovic,James S. Harris +10 more
TL;DR: In this article, the Ge/SiGe quantum well structure was proposed as a strong candidate for CMOS compatible light source and photoluminescence and electroluminecence showed enhanced optical properties over bulk Ge.
Proceedings ArticleDOI
Enhanced photoluminescence from Ge/SiGe quantum wells by epitaxial growth induced strain
Xiaochi Chen,Yijie Huo,Edward T. Fei,Ching-Ying Lu,Kai Zang,Muyu Xue,Theodore I. Kamins,James S. Harris +7 more
TL;DR: In this paper, enhanced photoluminescence from Ge/SiGe quantum wells with strain from -0.28% (compressive) to 0.25% (tensile) achieved by epitaxial growth techniques was demonstrated.