Yoshinori Takao

TL;DR: In this paper, the authors proposed a simplified model introducing a stopping power Sd(Eion) with a power-law dependence on the energy of incident ions (Eion), and applied this model to damaged-layer formation in plasma with an rf bias, where various energies of incident ion are expected.

TL;DR: In this article, a two-layer (SiO2/Si) optical model was revised for in-line monitoring of H2-plasma damage, showing that the interface layer plays an important role in the optical assessment of the plasma-damage layer.

TL;DR: In this article, a microplasma thruster was developed, consisting of a cylindrical micro-plasma source 10mm long and 1.5mm in inner diameter and a conical micronozzle 1.0-1.4mm long with a throat of 0.12-0.2mm in diameter.

TL;DR: In this paper, the structure and mechanism of ion-bombardment damage on silicon wafers exposed to plasma were investigated comprehensively using molecular dynamics simulations high-resolution transmission electron microscopy, and composition analysis by high resolution Rutherford backscattering spectroscopy, features such as gradual transition from the SiO 2 surface to the Si substrate and interface roughness were addressed.

TL;DR: In this paper, spectroscopic ellipsometry (SE), high-resolution Rutherford backscattering spectroscopy, and transmission electron microscopy were used to investigate silicon substrate damage caused by HBr/O2 plasma exposure.