照
照悟 鳴河
Publications - 7
Citations - 162
照悟 鳴河 is an academic researcher. The author has contributed to research in topics: Photomask & Photolithography. The author has an hindex of 2, co-authored 7 publications receiving 162 citations.
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Patent
Photomask pattern defect inspecting method and detecting method for fine figure pattern
TL;DR: In this article, a photomask pattern defect inspecting method for detecting a defect part of a mask by comparing the pattern of the mask with mask drawing data was proposed, where figure pattern data as drawing data and figure pattern arrangement information as drawing position information of the pattern data are included and the figure pattern as the drawing data are processed by the OPC correction.
Patent
Generation method of pattern data for electron beam drawing, proximity effect correction method used for the same, and pattern formation method using the data
TL;DR: In this article, an energy irradiation pattern of an electron beam and an energy threshold determination pattern are generated from design pattern data, and the difference between edges of the resist development threshold energy level line and the determination pattern is calculated when the difference is larger than a predetermined determination value.
Patent
Method for determining photomask defect
TL;DR: In this paper, a method for determining a photomask defect for improving the production yield of photomasks and suppressing the cost of an inspection is proposed, where a circuit data where data of a circuit to be fabricated on a semiconductor substrate by photolithography is prepared and a layout data according to the circuit data is prepared.
Patent
Defect inspecting method for photomask with additional figure
Yuji Machitani,Hideyuki Nara,Terusato Narukawa,Tatsuya Tomita,Yamazaki Seiji,秀之 奈良,達也 富田,清司 山崎,雄二 町谷,照悟 鳴河 +9 more
TL;DR: Wang et al. as discussed by the authors provided a defect inspecting method for a photomask with an additional figure which has good inspection efficiency, which includes a defect inspection step for detecting a defective part by inspecting the manufactured photOMask with the additional figure with specific detection sensitivity.
Patent
Drawing method and rectangular region dividing method in electron beam drawing
TL;DR: In this paper, a rectangular region dividing method was proposed for electron beam drawing with a spot beam, where a part of the scan pitch of the spot beam is irradiated with a pitch narrower than the preliminarily determined scan pitch to form an overlapped drawing portion.