Patent
Photomask pattern defect inspecting method and detecting method for fine figure pattern
TLDR
In this article, a photomask pattern defect inspecting method for detecting a defect part of a mask by comparing the pattern of the mask with mask drawing data was proposed, where figure pattern data as drawing data and figure pattern arrangement information as drawing position information of the pattern data are included and the figure pattern as the drawing data are processed by the OPC correction.Abstract:
PROBLEM TO BE SOLVED: To provide a method for efficiently inspect a defect of a photomask after OPC correction. SOLUTION: This is a photomask pattern defect inspecting method for detecting a defect part of a photomask by comparing the pattern of a photomask with mask drawing data by a specific inspecting machine; and figure pattern data as drawing data and figure pattern data arrangement information as drawing position information of the figure pattern data are included and the figure pattern data as the drawing data are processed by the OPC correction. The photomask is inspected according to the mask drawing data to previously extract a fine figure pattern, such as a TEG pattern (test structure) of a part other than the OPC-corrected part as a fine figure pattern which should not be detected originally as a defective part, but is frequently detected as a defect part and when the photomask is inspected, the fine figure pattern part which should not be detected as a defect part originally is not regarded as a defect. COPYRIGHT: (C)2002,JPOread more
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References
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Patent
Defect detecting device and method thereof
Yukio Kenbo,Kazuhiko Matsuoka,Hiroshi Morioka,Hidetoshi Nishiyama,Minoru Noguchi,Yoshimasa Oshima,Yoshiharu Shigyo,義春 執行,良正 大島,一彦 松岡,洋 森岡,英利 西山,行雄 見坊,稔 野口 +13 more
TL;DR: In this paper, a defect detection system was proposed to detect a foreign matter at high speed in full automation with high accuracy by clearing signals generated according to a repetition pattern of the large pitch on a board while comparing them with each other.
Patent
Method for inspecting mask for light exposing
TL;DR: In this paper, a mask for light exposing having a shape different from the original design data by receiving the influence of a proximity effect was inspected by using a defect inspecting device of a system for comparing and inspecting the design data and mask patterns.
Patent
Pattern verifying method and verifying device
Hagino Ichiro,Tawara Katsuji +1 more
TL;DR: In this paper, a pseudo defect pattern detecting means is used to detect the pattern with which the size of the pattern graphics attains the value below the predetermined value in accordance with the coordinates of pattern graphics registered in the first graphic processing data memory section 8.
Patent
Method and device for layout graphic verification
TL;DR: In this paper, a layout graphic verification device is proposed that can shorten the inspection time for notch area by converting segments of layout graphic into vector data of a link structure enabling retrieval in a specific direction, then detecting an object graphic outside area on the basis of the converted vectors and detecting the area as a design standard violating place unless the area meets previously set design standards.
Patent
Device and method for figure verification, and recording medium
Yukisada Horie,Yoshihisa Komura,Toru Miyauchi,Takeo Moriyama,Noriko Soma,Masahito Uechi,志定 堀江,徹 宮内,佳久 小村,武郎 森山,将人 植地,紀子 相馬 +11 more
TL;DR: In this article, a CPU extracts error figures by comparing and verifying manufacture data generated from basic data by multiple generating methods and groups the extracted error figures according to the features of those figures.