Patent
Chamber pressure state-based control for a reactor
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TLDR
A process chamber containing a substrate has at least one process gas introduced for reacting with a surface of the substrate to form a layer on the substrate, and the gas creates a certain pressure in the chamber as discussed by the authors.Abstract:
A process chamber containing a substrate has at least one process gas introduced for reacting with a surface of the substrate to form a layer on the substrate. The gas creates a certain pressure in the chamber. At a certain time, the gas is expelled to end the reaction, and the gas pressure is reduced. The detection of the change in pressure in said chamber automatically controls valves to supply a second gas into the chamber to further react with the surface of the substrate.read more
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