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Dual-beam skin friction interferometer

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TLDR
In this paper, a portable dual-laser-beam interferometer is described that nonintrusively measures skin friction by monitoring the thickness change of an oil film at two locations while said oil film is subjected to shear stress.
Abstract
A portable dual-laser-beam interferometer is described that nonintrusively measures skin friction by monitoring the thickness change of an oil film at two locations while said oil film is subjected to shear stress. An interferometer flat is utilized to develop the two beams. Light detectors sense the beam reflections from the oil film and the surface thereunder. The signals from the detectors are recorded so that the number of interference fringes produced over a given time span may be counted.

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Journal ArticleDOI

Modern developments in shear-stress measurement ☆

TL;DR: In this article, three relatively modern categories of skin-friction measurement techniques are broadly classified as microelectromechanical systems (MEMS)-based sensors, oil-film interferometry, and liquid crystal coatings.
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Method and apparatus for evaluating the thickness of thin films

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Apparatus for measuring thickness of object transparent to light utilizing interferometric method

TL;DR: In this paper, an apparatus for measuring the thickness of an object transparent to light utilizing an interferometric method is described, which includes a light source for generating a coherent light beam to which an object to be measured is transparent, an illumination unit for radiating onto the object the incident light beam as scanned over a range of angle of incidence varying from a predetermined angle of incidence θ A to another one of incidence θ B, and a photosensor unit for detecting light intensity changes resulting from changing of the optical path difference between two light beams reflected by the upper and
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Multi-beam optical probe and system for dimensional measurement

TL;DR: In this article, a non-contact multi-beam optical probe was proposed for the dimensional measurement of objects. But it was not shown how to use it in the real world.
References
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Patent

Interferometric process and apparatus for the measurement of the etch rate of opaque surfaces

TL;DR: In this paper, an interferometer system and process for detecting etch rates in opaque materials, such as silicon or metal, has means for producing a pair of parallel light beams, one of which is directed to the surface of the opaque material and the other of which was directed to an adjacent transparent masking material.