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Patent

Dual-gate schottky barrier gate fet having an intermediate electrode and a method of making same

TLDR
In this paper, a dual-gate Schottky barrier gate field effect transistor is provided with an intermediate electrode between a first and a second gate electrode, which forms an ohmic contact with a semiconductor substrate of the transistor.
Abstract
A dual-gate Schottky barrier gate field effect transistor is provided with an intermediate electrode between a first and a second gate electrode. This intermediate electrode forms an ohmic contact with a semiconductor substrate of the transistor. The transistor is produced by etching a first film formed on a planar surface of the substrate by the use of a pair of mask pieces to leave a pair of gate electrodes narrower than the mask pieces and projecting a metal capable of forming an ohmic contact with the semiconductor towards the planar surface perpendicularly thereof. The projected metal provides source and drain electrode on both sides of the gate electrode pair and an intermediate electrode between the gate electrodes. The intermediate electrode may be left floating during operation.

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Patent

Double gate trench transistor

TL;DR: A field effect transistor is formed with a sub-lithographic conduction channel and a dual gate which is formed by a simple process by starting with a silicon-on-insulator wafer, allowing most etching processes to use the buried oxide as an etch stop.
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TL;DR: In this paper, a multi-layer gate structure is formed on an active region formed in a semiconductor substrate, and a first aluminum layer of the gate structure, adjacent to the active region, is selectively etched to form a T-shaped gate electrode.