Proceedings ArticleDOI
Electrical CD characterisation of binary and alternating aperture phase shifting masks
Stewart Smith,M. McCallum,Anthony J. Walton,J.T.M. Stevenson +3 more
- pp 7-12
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TLDR
In this paper, the authors examined the issues involved in the use of relatively low cost Electrical Critical Dimension (ECD) measurement of mask features and proposed a modified cross-bridge test structure to allow the on-mask measurement of dense and isolated, binary and phase shifted layouts.Abstract:
Many of the recent advances in optical lithography have been driven by the utilisation of complex photomasks using Optical Proximity Correction (OPC) or phase shifting technologies. These masks are difficult and expensive to manufacture so the ability to test and characterise the mask making process is very important. This paper examines the issues involved in the use of relatively low cost Electrical Critical Dimension (ECD) measurement of mask features. Modified cross-bridge test structures have been designed to allow the on-mask measurement of dense and isolated, binary and phase shifted layouts. The results of electrical and Critical Dimension Scanning Electron Microscope (CD-SEM) testing of these structures are presented and indicate the lower variability associated with ECD measurements. In particular the adverse effect of phase shifting elements on the accuracy of SEM measurements is highlighted.read more
Citations
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Proceedings ArticleDOI
Test structures for CD and overlay metrology on alternating aperture phase-shifting masks
Stewart Smith,M. McCallum,Anthony J. Walton,J.T.M. Stevenson,Paul D. Harris,A.W.S. Ross,A.C. Hourd,Liudi Jiang +7 more
TL;DR: In this paper, the alignment between the chrome blocking features and the phase shifting regions etched into the quartz substrate was measured using an atomic force and scanning electron microscope measurements to explain anomalies in previously presented results.
Proceedings Article
On-mask CD and overlay test structures for alternating aperture phase shift lithography
Stewart Smith,M. McCallum,Anthony Walton,J.T.M. Stevenson,Paul D. Harris,Alan W. S. Ross,A. C. Hourd,Liudi Jiang +7 more
TL;DR: In this article, atomic force and scanning electron microscope measurements of electrical structures for the measurement of critical dimension on alternating aperture phase shifting masks are presented, and a new capacitance test structure which can measure the alignment between the chrome blocking layer and the phase shifting areas etched into the quartz mask substrate is presented.
Proceedings ArticleDOI
Development of Eectrilcal On-Mask CD Test Structures Based on Optical Metrology Features
Andreas Tsiamis,Stewart Smith,M. McCallum,A.C. Hourd,O. Toublan,J.T.M. Stevenson,Anthony J. Walton +6 more
TL;DR: In this paper, the electrical test structures are based on the Kelvin bridge resistor to measure the widths of isolated and densely packed lines and spaces, which can be used to extract information about proximity effects in the mask making process and to generate rules or models for the correction of mask designs.
Journal ArticleDOI
Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks
Stewart Smith,Andreas Tsiamis,M. McCallum,A.C. Hourd,J.T.M. Stevenson,Anthony J. Walton,Ronald G. Dixson,R.A. Allen,James E. Potzick,Michael W. Cresswell,Ndubuisi G. Orji +10 more
TL;DR: In this article, electrical, optical, and atomic force microscope (AFM) measurements of critical dimension (CD) made on a chrome on quartz photomask have been compared.
Proceedings ArticleDOI
Improved test structures for the electrical measurement of feature size on an alternating aperture phase-shifting mask
TL;DR: In this article, the phase shift mask was used to extract a consistent, and accurate, sheet resistance, and the measurements on linewidth structures have demonstrated an improved capability with the CD offset variability being reduced to a quarter of the previous value.
References
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Book ChapterDOI
A method of measuring specific resistivity and hall effect of discs of arbitrary shape
Journal ArticleDOI
Bridge and van der Pauw Sheet Resistors for Characterizing the Line Width of Conducting Layers
Journal ArticleDOI
An Experimental Study of Various Cross Sheet Resistor Test Structures
TL;DR: In this paper, a cross sheet resistor was designed to give the same (within 0.5%) measured sheet resistance as conventional van der Pauw structures, and the effect of joule heating on measured sheet resistances was observed in both large and small cross structures.
Journal ArticleDOI
Phase-shifting masks gain an edge
TL;DR: The potential, working principles, and approaches in phase shifting masks for optical lithography are discussed in this article, and the tradeoffs of each approach, and fabrication, inspection, repair, and tolerances are considered.
Journal ArticleDOI
Analysis of the Greek cross, a Van der Pauw structure with finite contacts
TL;DR: In this article, a theory for the Greek cross, a Van der Pauw structure with contacts of finite lengths, is given and the potential problem has been solved by means of conformal transformations.