Patent
Illumination system for ocr of indicia on a substrate
Donald R. Wilt,Richard S. Sidell +1 more
Reads0
Chats0
TLDR
In this article, an illumination system (10, 40, 74, 100) is provided having one or more light sources (24, 26), opaque baffles (30, 32), and mirrors (50, 64, 66) for illuminating indicia on a substrate, such as a semiconductor wafer, for viewing by a camera.Abstract:
An illumination system (10, 40, 74, 100) is provided having one or more light sources (24, 26), opaque baffles (30, 32), and mirrors (50, 64, 66) for illuminating indicia on a substrate, such as a semiconductor wafer (18), for viewing by a camera (12, 42) aligned parallel to or at an angle (14) to the substrate. The light sources (24, 26) include light emitting diodes for illuminating soft marks and broad spectrum incandescent lamps for illuminating hard marks. Dark field and light field illuminators are provided for enhanced reading of light indicia on a dark background and dark indicia on a light background, respectively. A light control unit (158) allows for manual or automated control of light source selection and light intensity. Opposing mirrors extending along the optical paths of the light sources reflect light emitted from the light sources into the camera's field of view, thereby increasing the illumination efficiency and permitting the use of fewer light sources.read more
Citations
More filters
Patent
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
TL;DR: In this paper, a defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects, which signals for initiation of darkfield illumination.
Patent
Method and system for calibrating a laser processing system and laser marking system utilizing same
TL;DR: In this paper, a method and system for calibrating a laser processing or marking system is provided, which includes: calibrating the laser marker over a marking field; obtaining a position measurement of a workpiece to be marked; associating stored calibration data with the position measurement; relatively positioning a marking beam and the workpiece based on at least the associated calibration data; and calibrating an LIDAR marking system in at least three degrees of freedom.
Patent
Light pipe illumination system and method
TL;DR: In this article, a light pipe is used to provide a high-angle bright field illumination pattern on the subject with a first portion of the light and for reflecting a second portion of light for providing a low-angle dark-field illumination pattern.
Patent
Diffuse surface illumination apparatus and methods
TL;DR: In this paper, an illumination apparatus is provided for a hand-held imager (30) preferably to provide diffuse illumination for encoded symbology carried directly upon an article, component, etc., or upon a substrate carried by an article.
Patent
Method and apparatus for reading firearm microstamping
Todd E. Lizotte,Orest Ohar +1 more
TL;DR: An indicia as discussed by the authors is a multi-dimensional array of encoded marks, including encoded marks determined by spectral encoding variables representing the selected information wherein each spectral variable is spectrally distinguishable from others of the spectral variables representing variables, and an encoded pattern of the encoded marks is determined by algorithmic transformation of selected information.
References
More filters
Patent
Apparatus for projecting a series of images onto dies of a semiconductor wafer.
Ronald S. Hershel,Martin B. Lee +1 more
TL;DR: In this article, an apparatus for forming on a semiconductor wafer unit magnification images of a reticle pattern is presented. But it is not shown how to construct the reticle patterns on the wafer.
Patent
Laser processing apparatus
TL;DR: In this article, the authors present a laser processing apparatus for projecting a spot of laser beam onto a portion of a microcircuit pattern on a semiconductor wafer, photographic mask or the like to cut the lead or anneal the limited area.
Patent
Calibrating laser trimming apparatus
TL;DR: In this article, a laser trimming apparatus calibration system including a laser beam positioning mechanism, imprinting a mark on a medium to establish an actual laser position, comparing the imprinted mark with the desired nominal position and producing a result indicative of the difference between the actual position and the nominal position is presented.
Patent
Method of and apparatus for modulating a laser beam
TL;DR: In this paper, a laser system operating in both a lead bonding mode and a lead severing mode was presented, where the Q-switch was switched at a rate high enough to generate laser pulses suitable for severing the leads without heating adjacent portions of the leads.
Patent
Light beam positioning system
TL;DR: In this paper, an error correction processor is used to compensate X and Y position coordinate signals (X and Y signals) produced by a conventional position data generator for delivery to a light beam positioner, which allows the use of a single command data file in the system control computer, which is capable of controlling different systems of the same model type.