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Impurities and point defects in semiconductors

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The article was published on 1981-01-01 and is currently open access. It has received 58 citations till now. The article focuses on the topics: Solid-state physics & Crystallographic defect.

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Doping of Semiconductors Using Radiation Defects Produced by Irradiation with Protons and Alpha Particles

TL;DR: One of the modern methods for modifying semiconductors using beams of protons and alpha particles is analyzed; this modification is accomplished by the controlled introduction of radiation defects into the semiconductor.
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Nanometer-size atomic clusters in semiconductors—a new approach to tailoring material properties

TL;DR: In this article, the physical mechanisms and fundamental methods of obtaining nanometer-size atomic clusters in semiconductors are discussed, along with the possibility of controlling the properties of these clusters and those of the resulting cluster-containing materials.
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Energy levels of vacancies and interstitial atoms in the band gap of silicon

V. V. Lukjanitsa
- 01 Apr 2003 - 
TL;DR: In this paper, the secondary processes of radiation-induced defect formation in Si crystals with charge-dependent selective traps for vacancies and interstitial atoms were identified; these level were determined previously from the effect of the irradiation conditions on the annihilation rate of elementary primary defects.
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Effect of electron irradiation on carrier removal rate in silicon and silicon carbide with 4H modification

TL;DR: In this article, the effect of successive (up to fluences of 3 × 1016 cm−2) irradiation with 900 keV electrons of samples made of FZ-Si and 4H-SiC (CVD) has been performed for the first time.
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Positron annihilation on defects in silicon irradiated with 15 MeV protons

TL;DR: It is argued that the value of activation energy of the isochronal annealing E(a) ≈ 0.74-0.59 eV is due to dissociation of the positron traps, which is accompanied by restoration of the electrical activity of the phosphorus atoms.